Used TEGAL 901e #9016256 for sale

TEGAL 901e is a high performance etcher/asher for photoresist processing of large-area substrates, such as Si, SiO2 and GaAs. This combination etcher/asher is based on a highly efficient, low-pressure sidewall injection plasma source that uses resonant that reduces etch gas consumption, thereby minimizing contamination and decreasing the time required for wafer processing. TEGAL 901 E features a wide range of plasma parameters, such as pressure settings, gas flow settings and RF power settings, which allow users to optimize their process parameters and increase the etch rate and quality of their products. The etcher/asher also provides excellent uniformity, as well as precise, high-quality etching. In addition, 901e is capable of photoresist treatments that cannot be performed using conventional wet chemical etchants. 901 E is equipped with integrated diagnostics, which allow users to monitor process conditions in real time. These diagnostic parameters include etch rate and quality, RF power, vacuum pressure, and gas flow. This system provides the user with enhanced process control and allows for the optimization of their process for higher throughput and yield. TEGAL 901e also provides a high degree of process uniformity across the entire substrate, due to the highly efficient, low-pressure sidewall injection plasma source design. This feature is especially useful when processing larger substrate sizes and enables users to achieve an increased number of wafer lots compared to conventional wet chemical etchants. TEGAL 901 E features a two-chamber design, which provides a superior platform for etch processes that require surface treatment and ashing. The ashing chamber can be switched from a hot to cold mode, allowing users to switch between etching and ashing processes with minimal setup time. In addition to its ashing capability, 901e also provides precise timing and flow control for etching processes. 901 E is the ideal etcher/asher for demanding processes such as photoresist treatments and other photomasks and etching requirements. Its advanced features and high performance capabilities make TEGAL 901e a reliable and cost effective solution for etching and ashing large area substrates.