Used TEGAL 901e #9016257 for sale

TEGAL 901e is an advanced, high-throughput plasma etcher/ascher designed for the fabrication of photomasks, thin film heads and MEMS devices. It utilizes a patented pulsed laser-induced etching technique that provides up to five times the etch rate of traditional etching tools. It can achieve etch rates up to 25 μm/min with precise feature edge definition and minimal etch damage. The pulse-mode feature allows users to control the depth profile of the etch process and reduce redeposition of etched material. TEGAL 901 E is powered by a magnetic field confined inductively coupled plasma (ICP) source optimized for isotropic etching with high Uniformity, selectivity, and homogeneity. The ICP source is precise in controlling etch selectivity, adjustable with a tuning range of up to 500 degrees Celsius, and capable of up to 10 W power with high repeatability and stability. 901e provides precise control of etch and cooling gas delivery with independent mass flow controllers (MFC) and gas pressure control sensors (GPCS) for Ar, O2, N2 and other process gases. 901 E provides precise plasma etching with a chamber size of 450 x 400 x 450 mm3 and sample size of up to 3 x 3 in (76 x 76 mm). It features a fully automated FOUP loading module and an optical density detection system. Additionally, with its low-bearing plasma and impeccable design, TEGAL 901e provides superior contamination control with an outstanding life expectancy. TEGAL 901 E is an innovative etching tool designed for high-end semiconductor, photomasks and MEMS applications. It provides the highest accuracy in etching, precise control of etch delivery and parameters, and low-bearing plasma for contamination control. Easily automated, robust and cost-effective, it is the perfect tool for fabrication and high-end etching processes.