Used TEGAL 901e #9072033 for sale

TEGAL 901e is a state-of-the-art Asher/Etcher designed for use in semiconductor fabrication. This equipment features an automated operation that allow users to quickly and accurately etch and asher wafers of various sizes and materials. TEGAL 901 E utilizes High Frequency Induction (HFI) technology to achieve a high-quality etch rate and dual-sided chemical asher capabilities for a wide range of ashing requirements. This system also features an accuracy of 10nm for both etch and asher requirements. The robust performance of 901e is derived from its advanced wafer processing unit, which includes an advanced process chamber equipped with automated toolheads and an integrated gas distributor machine. This allows users toCreate very precise patterns with the laser and ensure the highest levels of repeatability, accuracy, and throughput. Also, the tool utilizes an advanced vacuum asset enabling efficient and repeatable vacuum pressure settings and sequence. 901 E has an advanced control software package which allows users to Monitor and control all process parameters, manually or automatically. This model also has automated wafer handling capabilities that allow users to Etch and asher up to four wafers simultaneously, allowing for fast and efficient high-volume production. An integrated high-precision, closed-loop wafer alignment equipment allows for precise alignment accuracy. TEGAL 901e is constructed from high-grade materials and components, making it highly reliable and durable. This system is designed to be both user friendly and maintenance friendly, with an easy-to-use software interface and advanced mechanical and electrical safety systems. In conclusion, TEGAL 901 E is a highly advanced Asher/Etcher that is capable of producing accurate and repeatable results for a wide range of semiconductor fabrication requirements. With its advanced wafer processing unit, closed-loop wafer alignment machine, and automated wafer handling capabilities, this tool is designed to address the high throughput and accuracy requirements of a wide variety of semiconductor applications.