Used TEGAL 901e #9181762 for sale

TEGAL 901e
Manufacturer
TEGAL
Model
901e
ID: 9181762
Wafer Size: 6"
Plasma etcher, 6".
TEGAL 901e is a state-of-the-art etcher/asher equipment used for photolithography and thin-film deposit technology. The system utilizes the latest vacuum and reaction chamber design, making it exceptionally reliable, repeatable, and precise. TEGAL 901 E also offers an unprecedented level of cost-efficiency for a mid-level unit. 901e's reaction chamber is 24" in diameter and utilizes a top-loading wafer holder. The wafer holder and the reaction vessel are both made of stainless steel, giving the machine excellent thermal stability. The tool also features impressive temperature control, thermocouple setpoints, and sub-ambient venting capabilities that allow for a wide range of process temperatures. The asset utilizes a dual source design which allows for the loading and unloading of both sources in the same chamber, offering unparalleled throughput and efficiency. The sources can be loaded and unloaded with minimal interference during processing. 901 E also offers precise control over metal-oxide evaporation rates, allowing for precise prediction of film properties. TEGAL 901e is an exceptional platform for processes including photolithography, metal-oxide evaporation, thin-film deposition, film etching, and photoresist stripping. It is a robust, dependable model suitable for a range of applications and is highly cost-effective for mid-level systems. It features a highly reliable, repeatable process cycle, superior temperature control, low-maintenance requirements, and low operational costs, making it an outstanding choice for high-volume production environments.
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