Used TEGAL 901e #9244751 for sale

TEGAL 901e is a state of the art etcher / asher designed to deliver superior performance in today's most demanding semiconductor fabrication processes. TEGAL 901 E features a powerful 500 Watt inductive source designed to deliver high contactangle etch profiles with high yields and turn-around times. Its combination of physical and chemical processes ensures consistent, repeatable etch patterns while providing superior control over critical parameters such as etch selectivity, overetch ratio, and etch depth. 901e also uses a unique high-density plasma source which produces high-powered ions with a narrow range of plasma energy. This allows it to selectively etch ultra-thin layers of both organic and inorganic films with superior, reproducible results. It also reduces off-target deposits and other artifacts from process transients, helping to minimize unintended damage to sensitive substrate materials. Aside from its etch capabilities, 901 E also features advanced control systems for advanced monitoring and control over its processes. It uses optical endpoint detection for precise control over etch duration, as well as its in-situ sensor system for monitoring operational parameters in real-time. It also features multiple warning systems designed to detect change in process conditions and alert the user to take action to prevent any adverse effects. TEGAL 901e also offers advanced diagnostics functions and built-in recipes to ensure that the most complex etch projects are completed accurately and efficiently. The recipe library allows users to save their frequently used etch processes, or to even use pre-programmed recipes to expedite some tasks. TEGAL 901 E is also designed with exceptional safety features like its built-in emergency shut-off system and active monitoring by the operator to ensure safe operation at all times. In summation, 901e is an advanced etch system designed to suit the needs of today's most demanding semiconductor fabrication processes. It offers superior substrate selectivity, high yields, and repeatable etch patterns, as well as advanced control over etch processes and monitoring for safety.