Used TEGAL 981 #9159791 for sale

TEGAL 981 is an advanced etcher/asher for the nano-fabrication industry. It is specifically designed for precision etching and ashing of microelectronic materials, using advanced plasma generation techniques. 981 offers fast and reliable etching of sub-45nm resolution features with its combination of Deep Reactive Ion Etching (DRIE) and Inductively Coupled Plasma (ICP) capabilities. TEGAL 981 is equipped with a broad range of process chambers that allows for a wide range of etch and ashing techniques and a variety of materials, including silicon, glass, and ceramics. It is equipped with a 13 cm long pumping system, RIE and ICP chambers, along with a vacuum turbo-molecular pump. This allows for the precise control of etch processes, with the ability to achieve nanometer-level precision. The system is also equipped with additional sensors and monitors that enable real-time control adjustments and optimization, while the built-in safety mechanisms ensure ultra-low levels of contamination. One of the most impressive features of 981 is its etch uniformity. With its combination of ICP and DRIE capabilities, it can etch layers with a thickness uniformity of up to 1%. This makes it ideal for etching materials ranging from metal layers to insulators and metal oxides. It is also capable of providing a very large depth of etch, up to 500um, making it suitable for high aspect ratio processing applications. TEGAL 981 also provides cost-effective operation compared to other etchers, thanks to its ability to process multiple workpieces simultaneously. This can result in significant cost savings in terms of reduced material costs as well as labor costs. Furthermore, the system comes with a range of advanced features that allow for greater flexibility when etching complex shapes and features, including compatibility with a variety of CAD programs. This makes it an ideal choice for any nano-fabrication needs.