Used TEGAL Plasmod #9186244 for sale

TEGAL Plasmod
Manufacturer
TEGAL
Model
Plasmod
ID: 9186244
Etcher 5" x 6" deep quartz chamber.
TEGAL Plasmod is an advanced etching and ashing equipment that provides superior process performance for a wide range of materials including silicon and compound semiconductors. The machine is designed for rapid and precise processing of various wafers with the highest quality. It uses an extremely advanced vacuum chamber with multiple gas depths and pressures to effectively perform etching and ashing processes. This system is capable of handling a wide range of wafer sizes from 2" to 8" diameter. It can also accommodate up to six wafers in one single batch with uniform positioning. The automation and stability of Plasmod are what make it a great choice for etching and ashing requirements. The etching and ashing process are both highly controlled and precisely monitored with TEGAL Plasmod. It features a powerful, programmable controller that is used to make detailed adjustments to the process. The user can define both the time and the flow rate of the etch and ash process. The controller can also be used to monitor the pressure, temperature, and gas composition to ensure the highest possible quality of the finished product. Plasmod also uses a unique pressure control unit to ensure that all of the gas levels are properly maintained and controlled at any given point in time. The user can also customize the machine to their specific needs and requirements. This includes the ability to configure the parameters such as gas flow rates, pressures, temperatures, and more. TEGAL Plasmod is also designed to be extremely easy to use and maintain. This includes easy to clean surfaces that make it easy to get the job done quickly and efficiently. It also features advanced safety features that help ensure that no harm or damage is done to the user or the environment when using the tool. Plasmod etching and ashing asset provides the highest level of quality, accuracy, and stability for etching and ashing needs. This model is ideal for both the research and industrial environments and is capable of providing a wide range of materials with perfect, precise results.
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