Used TEL / TOKYO ELECTRON CS-600 #9380681 for sale

ID: 9380681
Vintage: 1999
Plasma cleaner 1999 vintage.
TEL / TOKYO ELECTRON CS-600 is a photoresist equipment designed for use in the semiconductor manufacturing industry. It utilizes state-of-the-art optics, precision manipulators, advanced photolithography techniques, and process control software to produce photoresist patterns with high accuracy and consistency. TEL CS-600's compact design allows it to occupy less space while providing optimal parameters for performance. It is capable of working with a variety of photoresist materials, including silicate, polysilanes, sulflaromatics, and polyimides, making it ideal for use in semiconductor IC (integrated circuit) fabrication. The system's production speed rivals that of high-end photolithographic systems, reducing cycle time and promoting continuous production. TOKYO ELECTRON CS-600 utilizes two advanced optical lenses for imaging. Its high-resolution 1.4x imaging lens ensures accurate alignment of patterns on the photoresist and eliminates any optical distortion. The other lens has variable zoom capability for fine imaging control. The unit's two precision manipulators enable rapid alignment of the imaging lenses, while its automated control machine maintains pattern accuracy and process consistency. Apart from its impressive performance, CS-600 boasts easy operation and maintenance. Its user-friendly software allows for quick and efficient programming of photolithographic processes. Its standardized hardware interface allows for easy maintenance and replacement of parts. And its wide range of dedicated accessories can be used for automating photoresist applications and optimizing the production process. TEL / TOKYO ELECTRON CS-600 is an advanced photolithography tool that is ideal for use in semiconductor manufacturing labs. Its advanced optics, precision manipulators, automated controls, and user-friendly software make the asset highly reliable, accurate, and cost-effective. It is capable of producing high-quality photoresist patterns with speed and precision, making it an ideal choice for those looking to optimize IC fabrication processes.
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