Used TEL / TOKYO ELECTRON Telius TSP-3055SSS #9265564 for sale

ID: 9265564
Wafer Size: 12"
Vintage: 2007
Dry etcher, 12" Process: SHIN Processing type: Vacuum Wafer type: Notch Process gases: (16) Gases: SFC1480FAPP2PL8 VAT 65051-JH52-APS1 APC, 14" Gauge: Unit / Make / Model / Range Baratron (CM 1) / MKS / 627BRETDD2P / 33.33 PA Baratron (CM 2) / MKS / 627B11TDC2P / 1.333 PA Baratron (CM 2) / MKS / 626A01TDE / 133.32 PA Baratron (CM 2) / MKS / 51A11TGA2BA003 / 1.333 PA BA Gauge / INFICON / BPG400 SHIMADZU EI-4203 LMC-T1 Turbo Molecular Pump (TMP) SHIMADZU EI-4203MZ Turbo Molecular Pump (TMP) Controller SCINCO SELME12ZS-BP3 Robot HV Controller DAINEN AGA-50B2 Generator WGA-50E Generator HPK10Z1-TE2 DC HV Generator DAINEN AMN-50E3 Matcher DAINEN WMN-50C6A Matcher Sub module: AC Rack DC Rack Process module: Power supplies Gas box: Power supplies Data back up: USB Gas line injection: 16 Lines Gate: V-TAC SE2000 End point detection Does not include Hard Disk Drive (HDD) Missing parts: Load ports EPD PMT Sensor 2007 vintage.
TEL / TOKYO ELECTRON Telius TSP-3055SSS is an advanced etching/ashers equipment designed for high precision etching and ashing process of difficult to etch materials. It is equipped with high-end technology, superior flexibility and excellent surface resolution. The system consists of a main processing unit, four hot-plate style operating modules and one oxidation module. The main processing unit is equipped with a cavity plasma source, a rotating electro-magnet, and a plasma-grating. These components combined allow the unit to be flexible in its operation to accommodate a range of materials, from standard metal to delicate substrates. The hot plate modules are used to increase the etching and ashing speeds, and are temperature controlled to ensure optimal etching results. The hot plates can be used to rapidly heat substrates to temperatures ranging from room temperature to 1000 °C. The oxidation module increases the surface resolution of the etch, and can be used to create patterns on various substrates. The machine is highly accurate and features a 1 nanometer accuracy rating for both etching and ashing processes. It also has a scanning speed of up to 4 m/s, ensuring rapid and accurate process results. Additionally, the tool can be used in multiple repeatable cycles for processes such as photolithographic processes. TEL Telius TSP-3055SSS etching/ashing asset is one of the most versatile and advanced systems available. It is reliable and offers excellent accuracy and features for the etching and ashing of a wide range of substrates. The model is designed to ensure maximum process performance and high precision. It is the perfect choice for any laboratory, research facility, or industrial setting.
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