Used TEL / TOKYO ELECTRON TSP-305555SSSS #293767161 for sale
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ID: 293767161
Vintage: 2007
Etcher
Process: Oxide
(5) Loadports
iH160 Pumps:
Chamber position / Gases
Unit 1 / N2, C4F8, Ar, O2, CH2F2, CHF3, CF4, C4F6
Unit 2 / N2, C4F8, Ar, O2, CH2F2, CHF3, CF4, C4F6
Unit 3 / N2, C4F8, Ar, O2, CH2F2, CHF3, CF4, C4F6
Unit 4 / N2, C4F8, Ar, O2, CH2F2, CHF3, CF4, C4F6
2007 vintage.
TEL / TOKYO ELECTRON TSP-305555SSSS is an advanced etcher/asher equipment designed for precise and reliable semiconductor device manufacturing processes. Developed by TEL Limited (TOKYO ELECTRON), a leading provider of semiconductor production equipment, TEL TSP-305555SSSS integrates cutting-edge technology to enable high-performance etching and ashing processes critical in the semiconductor industry. At the heart of TOKYO ELECTRON TSP-305555SSSS is its advanced plasma etching technology, which allows for fine-tuned control of material removal on semiconductor wafers. The system is equipped with a state-of-the-art radiofrequency (RF) plasma source that generates highly reactive plasma species to effectively etch various materials with high selectivity and uniformity. This capability is essential for creating intricate semiconductor device structures with sub-micron precision. Furthermore, TSP-305555SSSS features a versatile process chamber design that supports both etching and ashing applications. The unit can be configured with different gas chemistries and process parameters to accommodate a wide range of material compositions and device designs. This flexibility enables semiconductor manufacturers to optimize process performance and yield for various device fabrication needs. In addition to its advanced etching capabilities, TEL / TOKYO ELECTRON TSP-305555SSSS is equipped with sophisticated process monitoring and control features to ensure consistent and reproducible results. The machine integrates real-time process monitoring sensors, such as optical emission spectroscopy (OES) and mass spectrometry, to track plasma parameters and endpoint detection during processing. These monitoring tools enable precise process control and endpoint detection, allowing operators to achieve the desired etch rate and endpoint accuracy. Moreover, TEL TSP-305555SSSS incorporates automation and software control functionalities to streamline operation and improve productivity. The tool is equipped with a user-friendly interface that facilitates recipe management, parameter adjustment, and data analysis for process optimization. Advanced software algorithms enable predictive maintenance scheduling and remote monitoring capabilities to enhance asset reliability and uptime. TOKYO ELECTRON TSP-305555SSSS is designed to meet the stringent requirements of semiconductor manufacturing environments, including cleanroom compatibility, safety features, and environmental compliance. The model is built with premium materials and components to ensure long-term durability and performance stability under demanding operational conditions. Additionally, TSP-305555SSSS complies with industry standards for safety, electromagnetic compatibility (EMC), and environmental regulations to support sustainable manufacturing practices. Overall, TEL / TOKYO ELECTRON TSP-305555SSSS represents a cutting-edge etcher/asher equipment tailored for high-precision semiconductor processing applications. With its advanced plasma technology, versatile process capabilities, and robust design, TEL TSP-305555SSSS offers semiconductor manufacturers a reliable solution for achieving superior device performance and yield in today's competitive semiconductor industry.
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