Used TEL / TOKYO ELECTRON TSP-305555SSSS #293767179 for sale

ID: 293767179
Vintage: 2007
Etcher Process: Oxide (5) Loadports iH160 Pumps: Chamber position / Gases Unit 1 / C4F6, C4F8, N2, O2, CH2F2, CHF3, CF4, Ar Unit 2 / C4F6, C4F8, N2, O2, CH2F2, CHF3, CF4, Ar Unit 3 / C4F6, C4F8, N2, O2, CH2F2, CHF3, CF4, Ar Unit 4 / C4F6, C4F8, N2, O2, CH2F2, CHF3, CF4, Ar 2007 vintage.
TEL / TOKYO ELECTRON TSP-305555SSSS is a highly advanced etcher/asher equipment designed for processing substrates in the semiconductor industry. This cutting-edge equipment offers a wide range of capabilities to meet the demands of today's semiconductor fabrication processes, making it an essential tool for high-precision etching and cleaning applications. TEL TSP-305555SSSS is equipped with a state-of-the-art gas delivery system that enables precise control over the etching and cleaning processes. The unit features multiple gas channels, each with independent flow control, allowing for the customization of gas mixtures and flow rates to optimize process performance. This level of control is essential for achieving uniform and reproducible results across a variety of substrate materials and sizes. One of the key features of TOKYO ELECTRON TSP-305555SSSS is its advanced plasma generation machine, which is essential for creating the reactive species needed for etching and cleaning processes. The tool utilizes high-frequency RF power to generate a plasma that can be tuned to the specific requirements of each process. This flexibility allows for the handling of a wide range of materials, from silicon and silicon dioxide to metals and dielectrics, with precision and efficiency. In addition to its plasma generation capabilities, TSP-305555SSSS is equipped with a robust vacuum asset that ensures a stable processing environment. The model features a high-performance turbomolecular pump that provides rapid evacuation of the processing chamber, creating the low-pressure conditions necessary for high-quality etching and cleaning. The vacuum equipment also includes advanced pressure control mechanisms to maintain the desired process conditions throughout the cycle. Another important aspect of TEL / TOKYO ELECTRON TSP-305555SSSS is its advanced wafer handling system, which is designed to accommodate substrates of various sizes and shapes. The unit features a robotic arm that can quickly and accurately position wafers within the processing chamber, ensuring precise alignment and processing. This level of automation not only improves process repeatability but also reduces the risk of wafer damage during handling. TEL TSP-305555SSSS is also equipped with a user-friendly interface that enables operators to easily program and monitor the equipment. The machine features a touchscreen display that provides real-time feedback on process parameters, such as gas flow rates, pressure levels, and plasma conditions. This intuitive interface allows operators to make adjustments on the fly, ensuring optimal process performance and productivity. Overall, TOKYO ELECTRON TSP-305555SSSS is a versatile and reliable etcher/asher tool that offers unparalleled performance and control for semiconductor processing applications. Its advanced features, including a precise gas delivery asset, plasma generation technology, vacuum model, wafer handling capabilities, and user-friendly interface, make it an indispensable tool for achieving high-quality results in semiconductor fabrication. With its cutting-edge capabilities and robust design, TSP-305555SSSS sets a new standard for etching and cleaning equipment in the semiconductor industry.
There are no reviews yet