Used TEL / TOKYO ELECTRON TSP-305555SSSS #293767182 for sale
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ID: 293767182
Vintage: 2008
Etcher
Process: Oxide
(5) Loadports
iH160 Pumps:
Chamber position / Gases
Unit 1 / N2, Ar, O2, C4F8, CH3F2, CHF3, CF4, C4F6
Unit 2 / N2, Ar, O2, C4F8, CH3F2, CHF3, CF4, C4F6
Unit 3 / N2, Ar, O2, C4F8, CH3F2, CHF3, CF4, C4F6
Unit 4 / N2, Ar, O2, C4F8, CH3F2, CHF3, CF4, C4F6
2008 vintage.
TEL / TOKYO ELECTRON TSP-305555SSSS is a cutting-edge etcher/asher equipment designed to meet the demanding needs of semiconductor manufacturing processes. This advanced tool is manufactured by TEL, a renowned global leader in semiconductor processing equipment. TEL TSP-305555SSSS model represents a significant advancement in plasma etching and ashing technologies, offering unparalleled precision and process control for achieving optimal device performance and yield. At the core of TOKYO ELECTRON TSP-305555SSSS system is its innovative plasma processing chamber, which houses the substrates to be etched or ashed. The chamber is equipped with high-performance gas delivery systems that enable precise control over the composition and flow rates of the process gases. This allows for the customization of etching and ashing recipes to accommodate a wide range of material types and process requirements. TSP-305555SSSS features a state-of-the-art RF plasma generator that is capable of producing highly reactive plasma species for efficient material removal and surface modification. The RF power supply delivers precise power levels to the plasma, enabling dynamic control over the etching and ashing rates. This results in uniform processing across the entire substrate surface, ensuring consistent device performance and reliability. Moreover, TEL / TOKYO ELECTRON TSP-305555SSSS is equipped with advanced endpoint detection capabilities that allow for real-time monitoring of the etching and ashing processes. By analyzing the optical emission spectra or other process signals, the unit can accurately detect when the desired endpoint is reached, ensuring precise control over material removal and process stoppage. This not only improves process repeatability but also minimizes the risk of over-etching or under-etching, which can lead to device failure or reduced yields. In terms of machine reliability and uptime, TEL TSP-305555SSSS excels with its robust design and advanced monitoring features. The tool is equipped with built-in diagnostics and predictive maintenance capabilities that help identify potential issues before they affect process performance. This proactive approach to asset maintenance minimizes downtime and reduces the risk of unscheduled maintenance, ultimately maximizing tool productivity and throughput. Furthermore, TOKYO ELECTRON TSP-305555SSSS is designed with user-friendly interface and software controls that facilitate ease of operation and process optimization. The intuitive software interface allows operators to easily program and adjust process parameters, monitor process performance in real-time, and analyze historical data for process improvement. This enables semiconductor manufacturers to achieve greater process control and efficiency, leading to higher yields and improved device performance. Overall, TSP-305555SSSS is a cutting-edge etcher/asher model that offers unmatched precision, reliability, and process control for semiconductor manufacturing applications. With its innovative plasma processing chamber, advanced RF plasma generator, endpoint detection capabilities, and user-friendly interface, TEL / TOKYO ELECTRON TSP-305555SSSS is poised to set new standards in plasma etching and ashing technology, helping semiconductor manufacturers stay at the forefront of technological advancements and market demands.
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