Used TRION Phantom II #9069756 for sale

TRION Phantom II is a high-performance etcher/asher designed to enable precise and efficient wafer or device processing. This powerful etcher/asher utilizes high-density plasmas with background gases to create controlled etch profiles. Utilizing source gases of chlorine, fluorine and oxygen, this equipment can be used to create vertical walls and precise surface etches in a variety of applications such as microelectronic packages, high-technology parts, mems/nano and related devices. Phantom II utilizes an on-board three-axis robot linear motor system with advanced three-dimensional motion control to provide automation of etching. This unit offers maximum speed, accuracy and repeatability from singulated wafers to long wafer runs. The robust robot machine has a stepping accuracy of +/-0.5mm as well as high acceleration and deceleration. To enhance the productivity of the tool, TRION Phantom II has a wafer capability of measuring up to 20 inches in diameter. It may contain up to eight process modules located both externally and internally, allowing dual-side processing with up to six process modules in the process chamber and two external modules. The asset also has an efficient gas control technology that allows multiple etching recipes or processes to be stored and recalled for easy and repeatable wafer process cycles. The on-board software control allows real-time adjustment of recipe parameters during the process, which permits fine-tuning of etching characteristics for specific product designs. The safety of the users is taken into consideration, with a global Exhaust Filtration Model designed to minimize particulate generation and emissions. The equipment has an integrated Leak Detection System that can detect the slightest gas concentrations within the enclosure. The presence of the software unit not only allows steps for the process automation, but also provides a variety of tools for data collection that provides information such as real-time wafer condition, etch speed and bed temperature. This provides users with a deeper understanding of the parameters during the process and helps to shorten production time. Phantom II is a high-performance etcher/asher designed to enable precise and efficient wafer processing. Utilizing a three-axis robot motion control machine with stepping accuracy, this tool also has an efficient gas control asset, a wafer handling capability up to 20 inches in diameter, and safety features such as integrated exhaust filtration and leak detection systems. With its data collection capabilities, the model can provide users with a deeper understanding of the etching process that can help to shorten production time and yield enhanced results.