Used TRION Phantom II #9308217 for sale

TRION Phantom II is a high-precision plasma etcher/asher that is suited for both etching and ashing in academic, industrial, and government research centers. It features an automated, three-stage process that can etch or ashing a variety of materials with a high degree of accuracy and speed. Phantom II starts with a power supply and vacuum chamber. Inside the vacuum chamber, a range of gases such as fluorine, oxygen, and argon are ignited using a high voltage source. This activated plasma breaks down and removes surface material as the material enters the workpiece holder, which is then placed into the processing area for etching or ashing. TRION Phantom II also comes equipped with an advanced intelligent motion module and a fast-steering equipment. The motion module controls the motion of the wafer holder, the rate of processing, and the size of the processing area. The fast-steering system directs the plasma to the desired surface area of the wafer, allowing for precise, uniform etching or ashing. Phantom II is equipped with a fully integrated, user-friendly operating unit, as well as a comprehensive library of materials and etching/ashing protocols. It includes parameters for etch rate, etch lead-in, etch sampling, target etch rates, and maximum etch rates. It also offers a range of safety protocols to protect both users and the plasma chamber. TRION Phantom II's etch and ashing techniques deliver superior results with higher quality than traditional plasma etching techniques. It is also extremely flexible, and can be used to process different sizes of materials, control etch speed, target areas, and work with various materials. Overall, Phantom II is a powerful, advanced etcher/asher machine that offers excellent accuracy, speed, and flexibility. It is easy to use and is suitable for a wide range of materials. The superior results it produces are highly valuable for research and industrial applications.