Used ULVAC CSE-1100 #9055174 for sale

ULVAC CSE-1100 is an advanced etcher / asher system for demanding applications in the semiconductor industry. This system is capable of producing fine structure etching in a wide variety of materials including silicon, germanium, and gallium arsenide. CSE-1100 features a 150mm single-wafer load lock chamber and an upgraded 300mm wafer capacity that is well-suited for high-volume production. The core of ULVAC CSE-1100 is its plasma source. This powerful plasma source has a unique long-life design for extended productivity. The source also features a built-in gas balance controller that allows for the precise adjustment of chamber pressure and gas flow rates to optimize etching performance. CSE-1100's ult-high-speed processor and large-capacity memory are purpose built for etching applications and can handle complex etching processes with ease. The processor also includes a built-in graph editor, allowing for the easy creation and manipulation of recipes for each application. An interface box provides control and monitoring of ULVAC CSE-1100's multiple systems, including the controller, process monitor, and safety systems. It also includes an RS485 interface for connection to a network or PC for remote operation. CSE-1100's advanced design also includes a sophisticated software package including a wide range of features for process control and optimization. Its innovative etching recipes and fuzzy logic control allow for precise etching results with minimal variation in process parameters. ULVAC CSE-1100 is a powerful etching system with a host of features designed to boost both throughput and quality of production for advanced semiconductor etching. Its high-performance plasma source, intelligent processor, and sophisticated software make it an ideal tool for etching complex structures.