Used ULVAC Enviro I #9014612 for sale
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ID: 9014612
Wafer Size: 6"-8"
Strip system, 6"-8"
Single chamber
Optical end-point detection
Downstream microwave and low-damage RIE modes
Single wafer
Load-locked
MESC compatible tool
Multi-step processing capabilities
Windows-based software
Off-line recipe selection
SECS/GEM communication standards
Data logging in the control system.
ULVAC Enviro I is an etcher / asher designed for fast etching and patterning of metals, alloys, and sometimes semiconductor materials. It is a compact, user-friendly equipment featuring an advanced controller and powerful motorized stage to enable accurate etching of target materials at high speeds. The system has a modular design that allows for easy upkeep and adjustments for a wide variety of process parameters. Enviro I is equipped with an advanced three-phase spinner which provides uniform etching of large target areas with a consistent rate. Its 10 x 10 cm process chamber ensures maximum evidence even of the finest equipment components, while a low-pressure limit switch ensures optimal safety. The unit also includes a high-temperature resistive heater which allows for rapid heat ups to temperatures up to 500°C, and a high-pressure resistive heater which is ideal for etching processes up to 250 Torr. Furthermore, ULVAC Enviro I is equipped with an automatic pressure control and vacuum venting, as well as plasma etching, substrate cleaning, pre-etching, and depth-profiling capabilities. Enviro I's intuitive PC-based control enables easy access to all functions and programming, allowing users to adjust process settings on the fly. The machine also features an intelligent auto-mode where the chamber atmosphere and pressure are adjusted, step by step, down to the target pressure automatically for each etching or patterning task. The all-in-one tool offers flexibility and convenience, ideal for patterning wafers, remembering masks, or etching metal parts precisely and rapidly.
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