Used ULVAC Enviro II #9272299 for sale

ULVAC Enviro II is a state-of-the-art, high-performance etching / ashing equipment developed by ULVAC Technologies Inc. ULVAE Enviro II is ideal for applications in semiconductor industries and materials science requiring a precise and uniform etching, ashing or crystallization. ULVAC Enviro II is a single-chamber etching / ashing system with a wide range of process capabilities. It has an advanced remote process control unit, allowing for both manual and automatic operation. The machine operates within a wide range of process gas, from inert gases to etchants. It has a full-featured closed-loop temperature and pressure control, producing uniform and repeatable process conditions. Enviro II is capable of operating in a wide range of temperature, pressure and atmosphere conditions to meet the most demanding requirements. The tool is designed to provide a clean, contamination-free working environment and features an automatic sample loading and unloading asset to enable high volume production. The model is complete with high-precision pressure and temperature sensing and control, ensuring fast and accurate process monitoring. ULVAC Enviro II additionally features a powerful vacuum equipment with a powerful high speed turbo molecular pump and rotary valve pumping system as well as fast response and long life electric vacuum valve. The unit is perfect for depositing films, depositing conformal films, ashing and etching, epitaxial growth, annealing, and data storage. Enviro II is built for high-throughput production. It benefits from ULVAC advanced multi-batch control technology, improved process gas mixing and further reduces set-up time. It is a production-ready machine boasting hiSpec III data logging and monitoring capabilities with GAT-Advance multi-point analysis for excellent process control capability with real-time data monitoring. ULVAC Enviro II is an exquisite tool of choice for critical etching and ashing processes, aiming to achieve the highest levels of accuracy, repeatability, and uniformity.