Used ULVAC NA1000 #9150936 for sale

ULVAC NA1000 is an etcher/asher specifically designed to meet the needs of high accuracy lithography processing. The equipment is capable of etching and ashing with minimal aberrations due to its tightly regulated mechanical and electrical feedback mechanisms. The etcher/asher uses an advanced ion beam plasma source to precisely create a high-density plasma capable of producing a beam of ions with a precise energy level, allowing for high-resolution patterning process. NA1000 is equipped with an automatic beam coaxial compensation monitor (ABCMTM) which constantly adjusts for error during processing and ensures precise patterning. The machine is also equipped with a variable focus lens system to adjust the beam size of the multistage ions evenly. This makes it ideal for etching and ashing processes involving curved surfaces. Additionally, ULVAC NA1000 offers a high power drive laser capable of outputting up to 550 watts at a pulse repetition frequency of 300kHz which provides excellent beam uniformity and energy response for an ultra-high power etch/ash process. NA1000 is designed for cleanroom applications and features an enclosed working chamber to ensure ultra-clean operation. The unit is also fitted with a vacuum pump to maintain a low vacuum pressure and reduce the risk of contaminating the process. The machine is capable of wafer process temperatures ranging from -80°C to 700°C, making it suitable for a variety of processes. The etcher/asher is compatible with Quartz and polyimide memory cards and comes with a range of optional accessories including a robotic wafer handling arm to help with wafer positioning and loading/unloading. Overall, ULVAC NA1000 etcher/asher is a highly advanced, precision machine designed to deliver optimal results for lithography processes. Its superior mechanical and electrical feedback mechanisms, variable focus lens, and high-power laser ensure consistent, precise patterning in a safe, cleanroom environment.