Used ULVAC NE 550 #9236724 for sale

ULVAC NE 550 is an etcher/asher designed for modern semiconductor industry applications. It is a single chamber etcher/asher that can handle a wide range of etching and ashing processes. It is equipped with a unique cathodic arc etching source technology that delivers perfect etching results with controlled sputtering. NE 550 is a high-precision tool that can perform atomic scale etching and ashing processes with the highest quality and reproducibility. Its plasma source is a perfected cathode arc discharge with a maximum voltage of 4.4 kV and power of 2 kW. It is capable of processing wafers from 200 to 500 mm in diameter and without any damage to the surrounding environment. This eliminates foreign matter generation, and therefore no hazardous chemicals are used during the etching and ashing processes. The air-lock chamber is fully sealed and utilizes a vacuum chamber of 1x10 to 6 Torr and temperature of up to 300 degrees C. Its uniformity and repeatability makes the device more productive, and it offers the highest performance for etching processes. The etching and ashing process time can be adjusted to the specific application depending on the material type and recipe. ULVAC NE 550 also offers some advanced features including the Edge Angle control equipment and the chamber fast cooling system. The Edge Angle control unit helps to reduce the etching time by controlling the angle of the etching source. This improves uniformity and reproducibility in etching results, and also prevents the oxidation of the substrate. The chamber fast cooling machine helps to reduce the thermal stability of the wafer. This tool helps to reduce defects due to temperature variation and improve the quality of the etched layers. Overall, NE 550 is an advanced etching tool that offers superior etching results and improved process uniformity and reproducibility. It ensures maximum process efficiency and the highest yield of devices. It is a perfect choice for high accuracy and high throughput etching applications.