Used ULVAC NE-700 #293807237 for sale

ULVAC NE-700 is a versatile plasma etcher and asher equipment designed for various semiconductor fabrication processes. This advanced equipment can perform precise plasma processing on various substrates, making it an essential tool in semiconductor manufacturing, research, and development. NE-700 features a robust plasma source that generates a highly reactive plasma for etching and ashing processes. The system includes a RF (radio frequency) power supply that delivers energy to the plasma, creating a uniform and controlled plasma discharge. This high-density plasma is essential for achieving accurate and repeatable etching and ashing results. One of the key features of ULVAC NE-700 is its flexibility in handling different substrate sizes and materials. The unit is equipped with a versatile chuck design that can accommodate various sizes of substrates, from small samples to full wafer sizes. This flexibility allows users to process different types of substrates without the need for additional equipment or modifications. NE-700 also offers precise control over process parameters, including gas flow rates, chamber pressure, RF power levels, and process time. Users can easily adjust these parameters to optimize etching and ashing processes for specific applications and achieve the desired results with high repeatability. The machine is equipped with advanced gas delivery and control systems that ensure accurate and stable flow rates of process gases during plasma processing. This precise control of gas flow is crucial for achieving uniform etching and ashing results across the entire substrate surface. ULVAC NE-700 features a sophisticated process monitoring and control tool that enables real-time monitoring of plasma parameters, such as plasma density, temperature, and composition. This monitoring capability allows users to optimize process conditions and minimize variations in etching and ashing results. In terms of safety and reliability, NE-700 is designed with multiple safety features to protect users and the equipment. The asset includes interlocks, pressure sensors, and alarms that ensure safe operation and prevent potential hazards during plasma processing. ULVAC NE-700 is also designed for easy maintenance and serviceability, with accessible components and user-friendly interfaces. This makes it a cost-effective solution for semiconductor fabs and research facilities that require reliable and high-performance plasma etching and ashing equipment. Overall, NE-700 is a cutting-edge plasma etcher and asher model that offers high performance, flexibility, and reliability for a wide range of semiconductor processing applications. Its advanced features and precise control capabilities make it an essential tool for achieving high-quality etching and ashing results in semiconductor manufacturing and research.