Used ULVAC NE 7700 #9111268 for sale

ULVAC NE 7700
Manufacturer
ULVAC
Model
NE 7700
ID: 9111268
Vintage: 2000
Platinum dry etcher 2000 vintage.
ULVAC NE 7700 is a high precision, low temperature etcher/asher designed for etching a wide variety of materials. Its low temperature capability enables it to etch delicate and sensitive materials with minimal risk of degradation. NE 7700 has a process chamber that is constructed of stainless steel with an internal volume of 71L. It is provided with a carbon dioxide (CO2) gas delivery system, allowing for accurate and uniform etching process control throughout the chamber. Its slit-loading design allows for easy substrate loading and unloading and provides protection against dirt particles in the process chamber. Additionally, an integrated vacuum pump is included to evacuate contaminants and volatile organic compounds from the process. For process control, ULVAC NE 7700 has a Power Supply Unit (PSU) with both manual and programmable power delivery. The PSU is highly accurate with its power-on time and power-off time settable in steps of 10 ms, and total power supply duration settable in steps of 25 ms. A Vacuum Pressure Indicator (VPI) is also included for monitoring the processing pressure throughout the process. NE 7700 is equipped with an Optimal Process Setting program which automatically controls the wet etching process based on the etching conditions. By entering the target etching depth and sensitivities to etch rate and profile, the program then calculates the optimum conditions for the etching process. The etch rate is adjustable from 0.2 to 20 μm/min and the etchant temperature range is 0°C - 70°C. ULVAC NE 7700 is a versatile etcher/asher that can be used to etch a wide variety of materials, including metals, semiconductors, and polymers. It's compact, desktop design allows it to be easily integrated into any laboratory environment, and it's low temperature capability makes it suitable for precise, sensitive etching applications. As such, it is an ideal choice for etching and ashing applications in universities, research institutes, and production environments.
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