Used ULVAC NE-950EX #293647319 for sale

Manufacturer
ULVAC
Model
NE-950EX
ID: 293647319
Dry etcher.
ULVAC NE-950EX is an etch/asher designed to meet the demands of high-end research and industrial applications. This instrument produces high quality, high resolution etching on wafers, integrated circuits, and other substrates. Utilizing a narrow electron beam, it delivers high etch rate, low contamination, and excellent surface quality. NE-950EX features a proprietary radial beam control equipment for superior depth control, and features a shielded hot cathode electron gun for improved beam stability and uniformity. Using ULVAC proprietary gas mixing system, the etcher supports a wide variety of gases, including methane, oxygen, nitric oxide, nitrogen gas, argon, and more. In addition, the unit is equipped with an automatic gas composition and flow control machine, as well as a comprehensive process control software for fast, efficient etching. The software also enables the user to set parameters for each etching process, to ensure consistent results. In addition, ULVAC NE-950EX provides a sealed RF plasma chamber, to minimize contamination when etching. Its sophisticated heating tool helps make etching more efficient by increasing the temperature of the process surface and ionizing the gas to form a plume of ions and electrons. These ions react with the substrate material, resulting in a uniform etching profile. The asset is also equipped with a built-in, automated vacuum model and a comprehensive equipment monitoring and diagnostic software. This monitoring software allows the user to monitor real-time system parameters, gas flow and pressure, chamber temperature, and error messages. Further, it offers the capability to export data to an external printer or computer for further analysis and recordkeeping. Finally, NE-950EX is designed for ease of operation and is offered with an intuitive user interface and touch-screen controller. This etcher/asher provides superior etch results, reduced substrate contamination, high surface quality and resolution, and excellent depth control in a compact and affordable unit.
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