Used ULVAC NE-950EXk #9226829 for sale

ULVAC NE-950EXk is an etching and ashing production equipment designed to meet advanced technological applications. This system is capable of etching and ashing with a wide range of processes and can be used to create fine structures and patterns on the surface of metal substrates. NE-950EXk uses ion bombardment to etch high-performance substrates in production and research environments. One of the key features of ULVAC NE-950EXk unit is its high ion beam density that allows for tighter process control and higher etch and ashing rates. With its high-grade materials including krypton and xenon ions, it can be used to create patterns in metal preparations from 20 to 1000 nm in size. The machine also includes an automatic substrate loading tool that can accommodate large-sized substrates and production batches up to 500 steps. NE-950EXk offers precise temperature control allowing operators to adjust the etch and ashing process precisely at different temperatures. The asset is equipped with a high-precision temperature controller and a vacuum chuck which prevents the generation of outgassing and makes it possible to precisely control the temperature of the substrate. ULVAC NE-950EXk also incorporates a semi-automated sputter deposition unit. This feature allows operators to quickly deposit films onto substrates, creating an ideal environment for etching processes. The model also includes an advanced etching controller with automated optimization settings that enable operators to achieve maximum quality and uniformity. NE-950EXk is designed with user friendly features such as an intuitive graphical user interface and a remote monitor that allows operators to monitor the equipment's status and performance. The system also features a touch screen display and menu navigation unit, allowing operators to easily control the machine settings. This etching and ashing tool is made of heavy-duty materials which ensures a long service life and reliability. ULVAC NE-950EXk is an ideal solution for etching and ashing a variety of substrates and films due to its precise parameters and temperature control. With its outstanding performance and reliability, the asset enables users to develop precise and precise films for complex production applications.