Used LEYBOLD APS 1104 #9226191 for sale

LEYBOLD APS 1104 is a photoresist equipment designed for lithography and high precision photolithography processes. It is particularly suited for use in microelectronic device fabrication and nanotechnology. The photoresist system consists of a light source and optics, a photomask, and a photoresist-coating application and curing station. The photoresist unit has a customizable light source, which consists of a light source coupled to an adjustable optical machine. The light source is designed to deliver wide, homogenous light pattern capability with an adjustable optical focus and uniform spot size. This ensures optimal uniform exposure of photoresist areas. An integrated shutter and intensity control allows for multiple exposures with varying light intensity for the refinement of design features. The photomask tool is an essential component of the print station. It is used for alignment and registration during the printing and exposure process. The photomask tool is adjustable to custom angles and rotation angles. Additionally, it highly precise and fine-tuned registration aids in achieving uniform coverage over the substrate. The photoresist-coating station is designed to apply and cure the photoresist in a uniform manner. It has an integrated spin and roll dispensing nozzle that provides even, homogeneous coverage of the substrate and application of successive patterns. A curing station allows for pre-defined temperature and duration for photoresist curing. APS 1104 also features an integrated wash and dry station for photoresist removal and development of structures on the substrate. This station includes a brush tool, which is ideal for cleaning the surface of the substrate prior to photoresist deposition. Overall, LEYBOLD APS 1104 is an excellent photoresist asset for microelectronics and nanotechnology research and application. Its adjustable light source and optics, photomask, and photoresist-coating station provide precise control and uniform exposure of photoresist areas. The model is also equipped with a wash and dry station for prep and development of structures on the substrate.