Used LEYBOLD APS 904 #9240499 for sale

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Manufacturer
LEYBOLD
Model
APS 904
ID: 9240499
System ESV 14 E-gun APS Plasma source: Argon gas Leycom IV Controller HV10 High voltage power supply D65B Backing pump Oil diffusion pump 6-Way crystal holder Standard calotte holder.
LEYBOLD APS 904 is a photoresist equipment designed to expose photosensitive material onto substrates for the purpose of lithography and device fabrication. It provides sub-micron resolution features, high accuracy, and clean edge profiles using a chromium, iridium, or nickel-based resist process. APS 904 is a state-of-the-art system that utilizes digital imaging technology for lithography applications. This unit can imprint images on substrates as small as 0.3µm. To achieve this resolution, the machine utilizes an optical source which passes through a beam splitter and onto a multilevel optical projection tool to maintain a perpendicular output beam. Imaging is accomplished by digitally focusing the beam and then passing it through a computer-controlled plate of lenses and mirrors. These are arranged to form a virtual image of the projected object on the substrate. LEYBOLD APS 904 features a dual in-line photoresist asset. This model utilizes a special ultra-low absorbance glass with an optical density greater than 1.45 to effectively reduce "background" exposure levels. The equipment has a variable repeat rate which can be adjusted from 0.5 to 1 second in 0.1 second increments. This enables precise lithography printing and increases throughput. In addition, APS 904 has a semi-automated system for airborne particle detection. This unit features the use of artificiallight, allowing particles suspended in the air to be diagnosed for their size and position. The machine can be programmed to stop the photoresist tool if excessive airborne particles are detected, thus increasing the safety of the lithography process. LEYBOLD APS 904 also comes equipped with a dual stage, low-vacuum asset to control resist coating and adhesion. The dual stage vacuum model consists of a roughing pump and a molecular pump working in sequence. This ensures efficient removal of trapped gasses, allowing for a remarkably clean vacuum environment. Overall, APS 904 is a reliable and accurate photoresist equipment, capable of producing high-resolution images in a safe and efficient manner. Its innovative use of technology and unique features enable the system to be easily adapted for different lithography applications.
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