Used EATON NOVA / AXCELIS 1204990 REV C #9145256 for sale

EATON NOVA / AXCELIS 1204990 REV C is an ion implanter and monitor device manufactured by AXCELIS. This device is used in semiconductor fabrication processes such as doping of silicon wafers with doped regions. AXCELIS 1204990 REV C employs advanced ion implantation technology for precise and uniform electrical characteristics. The device features a controller unit with x-y scanner, wafer stage, and multi-filament ion source, all combined in a single frame and integrated into an automated system. The wafer stage is used for holding and rotating the silicon wafer while it is being processed. The scanner is used for accurate placement of the ion beam to achieve the desired doping locations. The multi-filament ion source is a component of the ion beam-forming optics, used to generate a beam of highly energetic plus or minus ions of the desired elements, and guide them toward the target area of the wafer. EATON NOVA 1204990 REV C is designed to allow precise control over the ion beam implantation process, providing fine control over the energy, dose and profile of ions being implanted. The controller is capable of controlling both constant-current and constant-voltage implantation modes, with settable values for voltage, current, and ion species. This device is also equipped with a range of monitoring systems to monitor and maintain the quality of the ion implantation process. 1204990 REV C is capable of displaying data represented graphically, providing an in-depth picture of the process. EATON NOVA / AXCELIS 1204990 REV C is an ideal device for controlling and monitoring the implantation process in semiconductor fabrication. It provides highly precise control over the ion implantation process and enables complex and precise doping results. The integrated monitoring systems also make it possible to maintain the process parameters in a manner which ensures high-quality final products. With its advanced technology and precise control, AXCELIS 1204990 REV C is a reliable and versatile device for implantation and monitoring in semiconductor fabrication.