Used EATON NOVA / AXCELIS 8250 #9187098 for sale

EATON NOVA / AXCELIS 8250 is a highly advanced ion implanter and monitor used in semiconductor device fabrication. It is designed for the highest levels of process consistency, delivering superb net device performance and yields. AXCELIS 8250 combines a three-axis scanning mechanism with an advanced computer-controlled beam-voltage profile generator for superior accuracy in implanting both N-type and P-type dopants. The ion source of EATON NOVA 8250 is capable of delivering ion beam currents of up to 150 milliamps, with beam energies ranging from 10 to 700 keV. User-configurable settings for beam current, beam energy and scan area allow for highly tailored implants, with no additional hardware required. This advanced technology makes 8250 an excellent choice for doping both new and existing wafers. The integrated process monitor equipment allows for continuous analysis of the implanted wafer's characteristics, including dose, beam angle, tilt, total current, voltage, profile shift and dopant level. These advanced measurements give EATON NOVA / AXCELIS 8250 the capability to deliver implants with incredibly accurate dopant profiles, and with very specific characteristics to yield superior devices. The system also has a unique thermal imaging sensor technology to help verify optimum overall wafer temperature during the implantation process. AXCELIS 8250's advanced computer controller unit facilitates quick and consistent setup and operation of the implanter. The user-friendly interface allows for simple operation, and customizable parameters can be easily entered and saved in the machine for future use. The convenient remote maintenance feature and superb post-operation diagnostics make this tool simple and easy to maintain over time. EATON NOVA 8250 is an advanced ion implanter and monitor designed to deliver superior precision and homogenous device implants. This versatile, user-friendly asset can quickly and accurately deliver controlled ion beam current, beam energy and scan area for optimum dopant level and device performance. With its powerful monitor model, 8250 consistently delivers implants with exceptional accuracy and yields.