Used EATON NOVA / AXCELIS C-6000 #9248477 for sale

EATON NOVA / AXCELIS C-6000 is a specialized ion implanter and monitor equipment. It is designed to precisely dope semiconductor wafers and integrated circuit (IC) substrates using accelerated ions with enhanced accuracy and speed. The system utilizes an advanced ion gun for the implant process and high-resolution sensors for accurate monitoring of the implant process. AXCELIS C-6000 consists of a two-axis gantry unit using linear motors for ultra-precise movement of the ion source and wafer to ensure proper positioning in the X and Y planes. The motor controls are programmable, allowing for accurate implantation of the desired dopant profile. The ion source, typically a Kaufman ion source, is used for high-energy ion implant applications. The Kaufman source offers a wide range of ion species, allowing for flexible implant profiles on substrates. EATON NOVA C-6000 utilizes a high-resolution Faraday cup monitoring machine to enable precise monitoring and control of the doping process. This Faraday cup tool allows the velocity of the accelerated ions to be accurately measured and instantaneously controlled. Real-time information on the implanted dose can be acquired from the Faraday cup, allowing for more precise and accurate process control. In addition to the Faraday cup, C-6000 features an advanced resistive monitor asset for dose determination and control. This model uses a set of four parallel detectors to monitor the implanted dose in real-time. By comparing the reading from the detectors to pre-set values, proper implantation can be easily monitored and controlled. EATON NOVA / AXCELIS C-6000 includes an advanced vacuum equipment designed to enable the efficient utilization of ion beam energy for the implant process. The use of state-of-the-art turbomolecular pumps, an adequate choice of pumping lines and high effective pumping speeds ensure a stable vacuum environment. This system is designed to enable implant activities to take place at lower pressures, which can significantly improve the predictability and accuracy of the implant process. AXCELIS C-6000 is an advanced ion implanter and monitor unit, allowing for accurate and high-speed doping of semiconductor wafers and IC substrates. It utilizes an advanced ion gun, a high-accuracy Faraday cup monitoring machine, and an advanced resistive monitor tool for precise dosage control. In addition, an advanced vacuum asset ensures for efficient utilization of ion beams to provide accurate implantation of the desired doping levels.