Used EATON NOVA / AXCELIS Conversion kit for GSD 200 #293663564 for sale

EATON NOVA / AXCELIS Conversion kit for GSD 200 is an ion implanter and monitor equipment designed to more precisely monitor and measure GaAs process parameters in a single system. The GSD 200 is capable of producing optimized device performance for various types of GaAs devices, be it HBTs, PHEMTs, or LED/LD structures. This unit offers improved accuracy and reliability of implantation as well as monitor and control over the process parameters. Using this machine, the processor is able to monitor the voltage, current, and beam emission current of the ion implanter, as well as collect and analyze vital characteristics such as charge collection efficiency, instantaneous dose rate, and beam penetration depth for a more comprehensive implant performance evaluation. Also, the data packages collected by the GSD 200 facilitate correction of implantation parameters so as to ensure consistent implant profiles. The user interface of the GSD 200 is designed to be user-friendly and simple, allowing operators to easily input commands, while a graphical display monitor assists users in viewing critical parameter settings for accurate implant zonings. Setting this tool to meet optimal specific process parameters can be directed through an extensive parameter library, encouraging customization of implantation characteristics for a controlled, efficient, and reliable planar wafer process. In addition, the GSD 200 supports a wide range of power supplies, allowing for rapid switching of ion implantation energies. This asset also provides users with a unique energy spectrum shifting feature, available to compensate for energy shift factors, within a specified range. This is a very useful and valuable feature, as it helps to deliver uniform implantation profiles and better reproducibility, even when small changes in the implant voltage occur. AXCELIS Conversion kit for GSD 200 Ion Implanter and Monitor is an excellent low cost solution for superior GaAs monitoring and profiling. It provides reliable implant performance and ensures consistent implant profiles, offering users the assurance of precise implantation. Furthermore, its easy to use interface is both user-friendly and efficient, offering users complete control of implant parameters for optimized performance.