Used EATON NOVA / AXCELIS GSD 100 #9103072 for sale

EATON NOVA / AXCELIS GSD 100 is an ion implanter and monitor specifically designed for the semiconductor industry. It is a high-performance equipment that incorporates a variety of advanced features and provides a high level of accuracy, reliability, and flexibility. AXCELIS GSD 100 is based on a single stage platform, a multi-layer design, and an ion source system. The unit is designed to accommodate different types of ions, with an extended range of source energies and energies. It utilizes a high voltage source and augmented lagrangian magnetic field homogeneous as well as a beam homogenizing machine with an independently controlled magnetic field. The ion source and accelerating tool can be used separately or combined in a hybrid configuration for higher beam currents. The monitoring asset is comprised of a range of integrated components, including the GSD Main Board, a Vacuum Control Unit, a Beam Monitor, Voltmeters/Multimeters, and software packages. The GSD Main Board is responsible for controlling the beam and environmental parameters to the user specifications, with the control of the gas compositional using a series of valves. The Vacuum Control Unit allows for the maintenance of proper chamber pressure and crosstalk control. The Beam Monitor is responsible for the monitoring of the beam-on-target intensity and current, its rotation angle, and energy level. Finally, the Voltmeters/Multimeters are responsible for the measurements of the temperature, pressure, and current of the target during the implantation process. The software packages are used for the operation of the GSDMainBoard, the Vacuum Control Unit, and the Beam Monitor, as well as for the interfacing with other systems. The software includes an expert model with an integrated change of parameter configuration as well as a GUI/CLI interface. EATON NOVA GSD 100 also includes a custom programmable logic controller (PLC) that can be used for automation of the business. With its advanced features, GSD 100 can be used for a wide range of applications. It is used for the implantation of dopant atoms in semiconductors for a variety of industries, including communications, automotive, aerospace, and military. The equipment is also used in the manufacturing of thin film transistors (TFTs) and for etching and cleaning of silicon wafers. EATON NOVA / AXCELIS GSD 100 is a reliable system providing high accuracy in the control and monitoring of the implantation process. It provides a high level of flexibility for different kinds of processes, enhanced safety features, and a programmable platform for custom automated processes.