Used EATON NOVA / AXCELIS GSD 200 #9132020 for sale

EATON NOVA / AXCELIS GSD 200 is a state-of-the-art ion implanter & monitor. It is the most advanced implanter on the market, designed for the rapid and precise controlled implantation of dopant ions into substrates. It offers a wide variety of process control options, such as dose rate, energy range and ion species selection, which make it an ideal choice for the fabrication and production of semiconductor and optoelectronic devices. AXCELIS GSD 200 is specifically designed for medium- to large-scale production by using exacting automatic controls to ensure precise wafer implantation. EATON NOVA GSD 200 combines the best of both manual and automated processes in a single system for superior wafer coverage and yield. It features a fully automated platform, as well as a user-friendly touch screen interface which allows users to easily monitor and control the doping process. The system can achieve a beam current precision of +/- 0.2%, and the beam energy accuracy to +/- 0.5%. GSD 200 also has an automatic dose, energy, and flux rate adjustment that allows an accurate and repeatable implantation process. Its advanced wafer scanner can accurately position the substrate for implantation while the digital imager and dual cameras provide detailed reference images of the complete wafer surface. EATON NOVA / AXCELIS GSD 200 is also equipped with a large array of safety features, including a fully automated shutoff in the event of an emergency. An advanced power supply system optimizes the utilization of power and allows for greater efficiency. In conclusion, AXCELIS GSD 200 is an excellent solution for optimized ion implantation. It is equipped with the latest features and technologies in order to create the most consistent and repeatable implantation process. With its safety features and user-friendly interface, it is an ideal choice for a variety of applications.