Used EATON NOVA / AXCELIS GSD 200 #9173588 for sale
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ID: 9173588
Wafer Size: 6"
Vintage: 1992
Ion implanter, 6"
Energy 80kv or 160kv: 180 kV
15 ma system
Control system:
Sun workstation type: SPARC 5
Cell controller CPU PCB type: VME 177
Monitor size and type: LCD
Transformer: Oil
Device interface:
Ground electronic Dl rack: Yes, 1163960
Disk vac DI rack: Yes
Terminal beatline Dl rack: Yes, 1163962
Gas control rack: Yes
Source control DI rack: Yes
Dose control DI rack: Yes
Terminal electronic Dl rack: Yes
Main tower distribution DI rack: Yes
Terminal power distribution Dl rack: Yes
Ground power distribution DI rack: Yes
Disk thermal couple Dl rack: Yes, 1187280
Loadlock control DI rack: Yes, 1176551
Gas box:
Source cabinet: Yes
Gas lines (3 or 4 line): Non module
Gas type: HP or SDS
Line 1 HP (Ar) 1510A
Line 2 SDS (BF3) 8162
Line 3 HP (AsH3) 1501A
Line 4 SDS (PH3) 8162
Source / Terminal:
Source head type or P/N: Bernus
Extraction electrode type or P/N: 1153600, Old type
Extraction power supply P/N: OL8000HV unit 100W
Source rough pump type: No
Source Hi-Vac pump type: Diffusion pump
Beam guide P/N: Yes, Old type
P8 Turbo pump type: No
Dual vaporizer: No
Filament power supply: Yes
Vaporizer power supply: Yes
Arc power supply: Yes
Source suppression power supply: Yes
Analyzer magnet power supply: Yes
Source magnet power supply: Yes
Quadruple power supply: No
Quadrapole assy: No
Resolving / Endstation:
Post accel suppression power supply: Yes, -5 kV,100mA
Post accel high voltage power type: OL8000/104/05
Post accel electrode assy: Yes, 1165340
Post accel tube assy: Yes
Electron shower: Yes, E-show / Old type
Shower power supply P/N: Yes, 1168391
Electron shower gas bleed assy: No
Whole enclosure door: Yes
Wafer transfer controller type P/N: Old type-ASYNC
Robot controller type or P/N: Old type-ASYNC
Loadlock controller type or P/N: Yes, 1176551
Rotary controller type or P/N: 1169071, Belt type
Y-Scan controller type or P/N: Yes, 1169081
Gyro controller type or P/N: Old type-ASYNC, 1168391
Cryo pump P2 / On board: CTI Torr 8
Cryo pump P3 / On board: CTI Torr 10
Cryo pump compressor type: 8200 9600
Disk chiller type: Yes, HX-150
RP2 for P2 / P3 / Beamline / Process / Loadlock: No
RP3 for sliding seal: No
P9 Cryo pump / Compressor: No
Wafer buffer: No
Belt type
Current:
(2) HP
(2) SDS
Disk size: 6" (old type) 1173936
Manual / Drawing: No
Power requirements: 208 V, 50/60 Hz, 3-phase, 50 kVA
Currently de-installed and warehoused
1992 vintage.
EATON NOVA / AXCELIS GSD 200 is a heavy ion implanter and monitor designed for the semiconductor industry. It is used to implant ions into a variety of materials, including silicon, silica, germanium, tin, tungsten, gallium, and aluminum. The device incorporates an ion source with variable-energy ion beam currents of up to 400 μA and a large area X-Y scanner for accurate positioning of the beam spot. It also features a high-resolution, fast-speed control equipment for precise implantation. AXCELIS GSD 200 is capable of performing ion implantation on a wide range of substrates, making it ideal for the production of very small and complex device structures. The device can process devices ranging from a few micrometers to several millimeters in size. It offers high-end performance, with lowprocess-variation tolerances and constant uniformity, making it suitable for reliable production of highly-engineered devices. The device is equipped with a fully automated vacuum system to meet the low-pressure requirements of implantation. For added safety, the device has built-in safety interlocks. It also relies on an Automatic Particle Monitoring Unit (APMS) for online analysis of the particles in the chamber during implantation. EATON NOVA GSD 200 is designed to offer ease of use for the user. It comes with intuitive graphical user interfaces and multi-level restrictive access management. Control settings and other parameters may be adjusted directly via the touch-screen interface. In addition to implantation, GSD 200 is also capable of in-situ monitor and analysis of the implanted wafered. It is equipped with advanced wafer imaging technology that enables visualization of the wafer before, during, and after the ion implantation process. The device also features an up-to-date digital monitoring machine that records detailed information about the process parameters and wafer performance, such as route histories and dose scans. This data can be used by the user for troubleshooting and optimizing process transients. EATON NOVA / AXCELIS GSD 200 is a sought-after choice for high-yield production of complex designs. It provides a reliable platform for the production of highly precise semiconductor devices that meet the requirements of advanced technology.
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