Used EATON NOVA / AXCELIS GSD 200 #9262469 for sale

EATON NOVA / AXCELIS GSD 200 is an advanced ion implanter and monitor designed for use in semiconductor production facilities. The equipment is capable of providing high quality, reliable implants of both high energy, low energy, and ultra-low energy ions for use in a range of processes. This system is particularly effective for ion implantation of semiconductor substrates and circuits due to its superior accuracy and precision. AXCELIS GSD 200 is equipped with a robust ion monitor which provides real-time monitoring of ion dose, profile, and tilt parameters. This monitor provides accurate readings of the target dose and overall dosage profile in order to ensure implant precision and accuracy. EATON NOVA GSD 200 also includes a vacuum unit so that any heating or ion implantation of the substrate can be done in a vacuum environment, which further ensures the accuracy and performance of the machine. In addition, GSD 200 utilizes high resolution imaging capabilities as part of its ion implanting process. This imaging allows the user to visualize the progress of the implantation process, giving them greater control over the implant parameters and optimized ions for the specific application. The tool also has a range of advanced safety features to help protect both the user and the device itself from hazards associated with ion implantation. Overall, EATON NOVA / AXCELIS GSD 200 is an advanced and reliable ion implanter and monitor designed for use in semiconductor production facilities. It provides accurate implants of both high energy and low energy ions in a controlled vacuum environment and with the ability to be accurately monitored. It also incorporates high resolution imaging capabilities to ensure the accuracy of the implantation process. It is a valuable tool for any semiconductor production facility and provides users with the necessary accuracy and measurement tools for a variety of ion implantation applications.