Used EATON NOVA / AXCELIS GSD 200 #9395836 for sale
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ID: 9395836
Wafer Size: 6"
Implanter, 6"
Gases: B / As / Ar
Energy: 200 keV
Throughput: 210 Pieces / Hour
25-Slots cassettes
(4) Cassettes
ELS Source head
(2) Sun workstations
VME 177 Cell controllers
(2) SDS Gas lines (ASH3 and PH3)
(2) HEWLETT-PACKARD Gas lines (BF3 and Argon)
P-Shower electron
Post acceleration high voltage, 80 keV
Belt type rotary drive
Variable implant angle
2-Axis
Real time patented dose controller
Dose range: 5E11~1E16 Ions / cm²
Arm: Standard, 8"
Wafer holder: Standard, 8"
Beam energy: 1 MeV
Beam current: 1 mA
CE Marked
Power supply: 208 V, 3-Phase, 170 A.
EATON NOVA / AXCELIS GSD 200 is a high-performance ion implanter and monitor designed to meet the needs of semiconductor, medical, and scientific industries. It is designed and built to adhere to the most stringent global standards for quality and performance in the ion implantation and monitoring processes. AXCELIS GSD 200 is capable of operating at high-temperatures, voltage, and current levels to achieve superior performance and consistency of implant profiles and profiles. It features an advanced and high-performance control equipment able to provide precise control over ion beam parameters, particularly implant dose, substrate temperature, and accelerations to ensure exceptionally uniform and repeatable beam characteristics. The system also provides a wide range of optional features for improved control over the implantation process, including beam steering, data logging, optical gates, and other functionalities. Apart from superior performance, EATON NOVA GSD 200 is also highly energy-efficient, utilizing a low-voltage operation to provide improved performance with fewer moving parts and components. This significantly reduces power-consumption, resulting in an energy-efficient operation. Additionally, the unit also provides excellent process-monitoring capabilities through its advanced monitoring systems, such as radiation and gas-monitoring, vacuum-sensing, and through its high-sensitivity implant profile monitoring machine. This ensures precise control over the implantation process, improving product yield and process efficiency. Overall, GSD 200 is a superior quality and highly energy-efficient ion implanter and monitor capable of precise control over implant parameters, process-monitoring, and advanced optional features for improved process control. It is designed to meet the highest global standards for quality and performance and, provides improved product yield and process efficiency.
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