Used EATON NOVA / AXCELIS GSD 200 #9399024 for sale
URL successfully copied!
EATON NOVA / AXCELIS GSD 200 is a high performance ion implanter for the semiconductor industry that provides a highly precise, quality implant process. AXCELIS GSD 200 utilizes powerful ion sources to introduce dopants into the substrate material with a relatively high degree of control. This ensures that dopants are deposited with the necessary accuracy and in the desired ratios in the substrate layer. EATON NOVA GSD 200 is built for ultimate automation and cost-effectiveness, with a "Direct Substrate Increase" (DSI) technique where the ion source can be increased quickly, allowing for faster and more consistent implant doses. GSD 200's advanced equipment monitors the ion beam current, allowing for precise and accurate dose control. This system is designed to process a large range of substrate thicknesses with the highest levels of ions to the greatest number of substrates. EATON NOVA / AXCELIS GSD 200 is a highly reliable, robust unit with a long lifespan. It is designed to precisely control the ion sources and guarantee a consistent beam over the substrate, no matter the thickness. Additionally, a patented flux monitoring machine allows optimal performance with plasma cleaning of the substrate surface. High-quality sputtering ensures that the native oxides on the substrates are cleaned off and the layer becomes receptive to the droplets of ions being introduced. The physical composition of AXCELIS GSD 200 tool features state-of-the-art design. It has a patented, disk shaped ring source technology, a robust and powerful electron gun for high ion currents, advanced x-ray diagnostics in the form of azimuthal scans and vertical profiles of the implanting beams, and a whole series of advanced control systems to ensure accuracy. EATON NOVA GSD 200 is capable of implanting up to 8 ions simultaneously and provides precise alignment to ensure profiling fidelity. Overall, GSD 200 is a premium quality implanting asset designed to provide the most accurate and cost-effective implant process in the semiconductor industry. Its advanced ion sources, wide range of substrate thicknesses, and consistent beam control combine to make it an ideal choice for any implantation process. EATON NOVA / AXCELIS GSD 200's state-of-the-art design and its long lifespan make it a crucial asset for the production line.
There are no reviews yet