Used EATON NOVA / AXCELIS GSD 200E2 #14146 for sale

EATON NOVA / AXCELIS GSD 200E2 is an advanced ion implanter and monitor system for semiconductor production. It is a single-ended, digital-controlled, medium current oscillating-beam type of electron beam ion implanter suitable for both ion implantation and in-situ monitoring tasks. Using its comprehensive range of settings, AXCELIS GSD 200E-2 can precisely control the dose of ions to be implanted into the semiconductor material. It also has a precise control over the position and shape of the electron beam used to implant the ions, allowing for greater fine-tuning of the ion implantation process. In addition, EATON NOVA GSD 200 E2 provides an integrated in-situ monitoring system with a wide range of sensitivity and parameters. This allows for high precision and accuracy in the monitoring of ion implantation. The monitoring system also has automatic safety features to prevent implantation of too many ions and other effects such as contamination of the semiconductor material. To ensure proper operation of the equipment, EATON NOVA GSD 200E2 is designed with both direct and remote control options. This allows technicians to control the equipment from a console or from a separate computer workstation for greater flexibility and convenience. EATON NOVA / AXCELIS GSD 200 E2 also offers multiple diagnostic functions and options for data logging and analysis. This allows technicians to more quickly and accurately identify and troubleshoot any problems they may encounter during the ion implantation process. Overall, GSD 200E-2 is a sophisticated, reliable, and highly efficient ion implanter and monitor that provides precision and reliability for the demands of high-tech semiconductor production.