Used EATON NOVA / AXCELIS GSD 200E2 #293597564 for sale
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ID: 293597564
Wafer Size: 8"
Vintage: 2004
Medium current implanter, 8"
2004 vintage.
EATON NOVA / AXCELIS GSD 200E2 ion implanter and monitor is an industrial-grade implanter/monitoring equipment that is capable of delivering precise doses of implanted ions over a wide range of energies. It is capable of implanting ions with energies ranging from 1meV to 10keV, a much wider range than available with most other systems. The Eaton is built with a high degree of reliability and safety, making it ideal for applications where precision ion implantation and monitoring is required. The Eaton AXCELIS GSD 200E-2 is designed with a powerful energy analyzer that allows it to accurately calculate the energy of each implanted ion beam. The analyzer works by measuring the current-carrying electrical resistance of a beam of ions, enabling the system to determine its exact energy level. Additionally, EATON NOVA GSD 200 E2 is equipped with an ion beam current monitor that continuously measures the ion beam current during operation. This allows users to monitor and adjust the current in order to optimize the process of ion implantation. EATON NOVA / AXCELIS GSD 200E-2 features an advanced beam stabilization unit that helps ensure consistent and reliable beam delivery at the target implantation depth. The machine utilizes a series of magnets to create a uniform ion beam shape, ensuring improved uniformity of the implanted ions. Additionally, the tool is capable of automatically correcting for process deviations that may occur due to environmental or material variations, maintaining consistent dose control. AXCELIS GSD 200E2 also comes with a high-performance robotic wafer handler that allows it to handle wafers quickly and accurately. The robot is designed to move the wafers at high speeds, up to 30 chips/min, minimizing process time and improving throughput. Additionally, the robot is equipped with an automated alignment asset that ensures automated alignment of the ion beam at the specified implantation position, allowing users to achieve repeatable results. Overall, AXCELIS GSD 200 E2 is a reliable and accurate ion implanter and monitor that can handle a wide range of implantation energies. Its advanced features enable users to achieve precise doses of implanted ions at the required depths and can be trusted to deliver consistent, repeatable results. With its high levels of reliability, safety and efficiency, the Eaton EATON NOVA GSD 200E2 is a great choice for any application requiring precision ion implantation and monitoring.
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