Used EATON NOVA / AXCELIS GSD 200E2 #293801979 for sale

EATON NOVA / AXCELIS GSD 200E2 is a High Dose, High Efficiency ion implanter and monitor designed for semiconductor and related applications. It is a multi-beam, multi-aperture ion source that enables high-precision, repeatable doping of submicron feature sizes. It offers 10 times higher dose rates than conventional implanters and greater than 5 times the process uniformity. AXCELIS GSD 200E-2 uses AXCELIS patented e-refraction beam optics equipment to provide superior implant uniformity with high accuracy and repeatability. The system engages the electron beams from multiple different directions to provide a more uniform homogeneous dose field across the sample size. It also uses an advanced magnetic field unit for uniform Beam Energy Distribution (BED). EATON NOVA GSD 200 E2 is a high-precision implanter, capable of implants with a minimum of ± 2.5% relative peak dose uniformity and a short beam window of 10mm x 10mm. It has a standard process window of up to 150 mm x 150 mm (optional to 200 mm x 200 mm). It can also be configured to use up to 5 beams and operates at up to 50kV. The on-board monitoring machine enables operators to monitor the implanting progress. A wide range of diagnostic tools are available such as real-time plotting of beam position and focus asymmetry, beam current and energy monitoring. Furthermore, up to four external cameras and radio frequency detectors can be connected to the machine to detect any anomalies or irregularities. AXCELIS GSD 200 E2 also offers a wide range of safety features, such as an automatic safety shut-off tool that safely disables the machine in case of failure. In addition, all user inputs and machine settings are recorded for future reference. This ensures precise and repeatable installations for future applications. Overall, GSD 200 E2 is an ideal ion implanter and monitoring tool for semiconductor applications. Its high dose rates, precise and repeatable processes, comprehensive monitoring asset and advanced safety features ensures reliable and secure doping of submicron feature sizes.