Used EATON NOVA / AXCELIS GSD 200E2 #293813023 for sale

EATON NOVA / AXCELIS GSD 200E2 is an ion implanter and monitor designed by EatonAXCELIS Technologies to meet the demands of the semiconductor industry. It is a versatile, high performance implanter specifically designed for use with a wide array of wafer sizes and materials. This equipment works by accelerating ions to the wafer surface, which then penetrates the wafer surface and the ions are implanted. AXCELIS GSD 200E-2 has a highly efficient vacuum system designed to prevent implanter poisoning. It features two turbo pumps, two flood pumps, two rough pumps and two gate valves as well as a set of ion pumps. The ion pumps keep the chamber pressure low enough for implanting to occur. EATON NOVA GSD 200 E2 also contains a gas delivery unit that is used for controlling the flow of gas to the wafer surface, ensuring a uniform dose of the species being implanted into the wafer. EATON NOVA GSD 200E-2 features an operating pressure range of 1×10-7 to 1×10-5 torr or Pa and a wafer diameter range of 2 inches to 7.5 inches. It is also capable of powering up to 30 kilo electron volt (keV) ions and a maximum source current up to100 milliamp (mA). EATON NOVA / AXCELIS GSD 200E-2 is equipped with a host computer and software which controls the implanter and monitors real time data. The software is used to program the dose, species and other parameters for implanting. The computer also contains a geometric processor to ensure accuracy at each target point as well as mapping software for viewing the dose distribution. It also has a series of security features to prevent unauthorized access. GSD 200E2 incorporates sophisticated safety features, such as its ion source safety module and ion evacuation machine, to ensure maximum safety for personnel. The safety module monitors the chamber pressure and gas levels and then automatically shuts the tool down if the parameters are not within acceptable limits. The ion evacuation asset quickly evacuates implantation products in order to maintain a safe environment. GSD 200E-2 is an advanced model designed to meet the industry's needs for precision, efficiency and accuracy. With its sophisticated safety features, superior ion delivery equipment and real-time monitoring, AXCELIS GSD 200E2 can be a very useful tool in semiconductor production.