Used EATON NOVA / AXCELIS GSD 200E2 #293814956 for sale

EATON NOVA / AXCELIS GSD 200E2 is an ion implanter & monitor that allows for precise ion implantation and monitor control for the manufacture of semiconductor devices. This equipment features a high-temperature integrated ion source, a high-vacuum beam transport, two ultra-high-sensitivity sensors, and an integrated Multiple Beam Interlock (MBI) system. This ion implanter has been designed to facilitate the precise and reliable production of semiconductor devices and is ideal for both the high-volume production of micro- and macroelectronic devices, as well as for research and development. AXCELIS GSD 200E-2 ion implanter & monitor provides efficient, precise and reliable production with a wide range of available implantation settings. It utilizes a high temperature integrated ion source that can accelerate a wide range of ions, including boron, phosphorus, arsenic and other dopants, to high energies while preserving their optimum energy over a wide range of doses. This facilitates a broad range of applications, such as the precise implantation of junction depths or shallow junctions, precise and precise mixing of dopant elements, and precise and precise mixing of carriers. The ion implanter & monitor features two ultra-high-sensitivity sensors, the "TRIO" and the "Quadrate" that allow for precise sensing and control of the beam's position, size, and energy. Both sensors offer superior resolution and accuracy, even when exposed to highly energetic particles, while being resistant to welding radiation. The integrated MBI unit ensures that all implantation steps, such as beam focal plane alignment and stabilization, are performed in a consistent and reproducible way, ensuring excellent and reliable device performance. EATON NOVA GSD 200 E2 provides comprehensive data acquisition capabilities, allowing for versatile analysis and recording of the beam, with analysis and reporting of implantation parameters. It also features an automated process control machine and automated feedback control, allowing for efficient, accurate and reproducible implantation processes. The tool further provides diagnostics and reporting capability, along with integrated switching and power control. Overall, EATON NOVA / AXCELIS GSD 200E-2 ion implanter & monitor is an excellent and highly versatile asset for the production of semiconductor devices. It offers efficient, precise and reliable implantation processes, with a wide range of available settings. It is also highly reliable and durable, and is able to handle a wide variety of different ions. As a result, AXCELIS GSD 200 E2 is an ideal choice for the manufacture of both micro- and macroelectronic devices.