Used EATON NOVA / AXCELIS GSD 200E2 #293815735 for sale

EATON NOVA / AXCELIS GSD 200E2 is a high-performance ion implanter and monitor. It is designed for low-energy implant operations and is capable of high-energy operations with up to 4 kW beam current. The machine is equipped with a large array of control systems and algorithms to ensure precision and accuracy of the implanted material. AXCELIS GSD 200E-2 is equipped with a multi-axis traveling ion beam (TIB) assembly which allows for rapid, high-precision scans of the wafer surface and implantation of ions into the target material. This system can be manipulated digitally to provide very accurate and uniform dosage with high dose stability and repeatability. The ion beam is further enhanced with active beam current control and stabilizers to ensure maximal precision. EATON NOVA GSD 200 E2 is a user friendly system with a graphical user interface (GUI) that provides real-time displays of process parameters and data. This allows for easy monitoring and adjustment of the implant process. In addition, the machine is equipped with a host of safety features that protect the user, the equipment and the product being implanted. GSD 200 E2 is also equipped with a range of quality control options, including cross-sectional ion beam scan microscopy, spectral analysis, energy and topography measurement. This suite of options is important for optimizing the quality of the results delivered by the machine and for the quality assurance and monitoring of implanted samples. Overall, AXCELIS GSD 200 E2 is a powerful and effective tool for low-energy and high-energy ion implantation and monitoring. Its high power output and quality control features make it an ideal choice for industrial processing applications. Its user-friendly GUI and safety features provide a secure and reliable range of options that can optimize the ion implantation process and enhance the accuracy, uniformity and repeatability for a range of materials.