Used EATON NOVA / AXCELIS GSD 200E2 #9026352 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9026352
Ion implanter, 8"
(13) Batch wafers
Application process: High current implanter
System software Version: 4.9.1 (Sun OS)
Utility gas:
CDA, Machine air, Swagelok, 3/8" Sus male
Ar, Process air, Swagelok, 3/8" Sus male
PN2, Process vent, Swagelok, 3/8" Sus male
GN2, Purge vent, Swagelok, 3/8" Sus male
Exhaust:
(2) Environment, GEX, 500 CFM, 8" PVC, has exhaust hood
(2) RP Exhaust, SEX, 2" Sus, has exhaust hood
(1) Cyro pump, SEX, 20 CFM, 2" Sus, no exhaust hood
(1) Gas cabinet, SEX, 500 CFM, 8" PVC, 1, has exhaust hood
(1) Source cleaning exhaust, SEX, 65, 2.5" PVC, no exhaust hood
Cooling water:
(2) RP Cooling water, 14~28 psi, 5~8 GPM, 24º C, 3/8"
(1) City water, 55~75 psi, 7.5 GPM, 24º C, 1", to DI cooling water
(1) Cyro compressor, 14~28 psi, 5~8 GPM, 24º C, 1"
Endstation module:
(4) Cassette table (280 mm)
(2) Load buffer
(1) Dummy buffer
Mini-environment: Synetics
ATM Robot: OK
Notch/Flat finder: Notch type
Vacuum cassette: STD (VESPEL Support pin)
Load port interface: N/A
Beam profile oscilloscope: Tektronix TDS 210
Cell controller/version: Cell 177 (1915690, Rev. A)
Loadlock type: STD
Main SUN computer: Sparc station 5
Main monitor: 17", LCD
Second SUN computer: Yes (function unknown)
Second SUN monitor: N/A
Tape reader: NG
Printer: N/A
Process module:
Disk: Seg Si Coated, P/N: 11027061
Flag faraday with SRA: OK (11019550)
Electron/plasma shower: P-shower (1190160)
Plasma shower filament PS: Yes (EMS)
Bias aperature: Yes
Shower gas panel: Yes (STEC SEC-7320, 2 sccm)
Water bleed MFC: MKS (Type: 1150)
Ar/Xe Beamguide gas: Motor control
In-Vac arm: Yes
Wafer holder: Yes
Disk wafer clamp/unclamp: Roller type (1180270)
Gyro/Angle: NV-GSD-100
Linear drive: OK
Rotary drive: Direct drive
HYT Sensor: Yes (20SX)
Beam profile holes: N/A
Disk RGA Port: Yes
Resolving housing RGA Port: N/A
Wafer charge sensor: Yes
P-Shower charge monitor: Yes
P-Shower disk current: Yes
Loadlock controller type: 4-Axis DI
In-air wafer xfer controller: 4-Axis DI
Robot controller: 4-Axis DI
Beamline module:
HV Power supply: Hitek Power Inc.
HV Stack: OL8000/104/30, 100 KV
Post Accel. Volt: N/A
Extraction suppression PS: Glassman, PS/NV-15NN33, 2200158
AMU: Acelis
AMU PS: EMS 40-150-2-D0816
Hall probe: Axcelis
Max. extraction voltage: 90 KeV
Beam profiler hole: N/A
Decel function: N/A
Beamline purge kit: N/A
Source module:
Source head/vaporizer: ELS/No vaporizer
Filament PS: EMS 10-60
Arc PS: EMS 150-7
Cathode PS: yes
Vaporizer PS: N/A
Source magnet: Axcelis
Source magnet PS: EMS 25-25
Source bushing: Orange
Extraction assembly: Yes
Variable resolving aperture: Yes
Source ISO Transformer: STD
Source injection kit: N/A
Source cleaning exhaust: Yes
Block type: N/A
Gas box module:
Gap Loop #1: Ar, HP
Gap Loop #2: BF3, SDS
Gap Loop #3: AsH3, SDS
Gap Loop #4: PH3, SDS
Loop #1 MFC: MKS 1179A-14493, Ar, 10 sccm
Loop #2 MFC: MKS 1640A-011, BF3, 10 sccm
Loop #3 MFC: MKS 1640A-011, AsH3, 10 sccm
Loop #4 MFC: MKS 1640A-011, PH3, 10 sccm
Vacuum system:
P1/Source turbo: A2203C, SEIKO SEIKI
P1 Controller: STP-A2203C, SEIKO SEIKI
P2/Beamguide Cyro pump: CTI OB-8
P3/V3 Cyro pump: CTI OB-10
P9/Disk Cyro pump: N/A
RP1: Remote
RP2: Remote
IG1: SUZUKI G-75-NTT
P IG1: SUZUKI G-75-NTT
IG2: SUZUKI G-75-NTT
IG3: Stabile ion gauge
IG Controller: M/N: 360
Safety options:
(4) Smoke detectors
VESDA: N/A
CES Options: N/A
Others:
(2) Ground bars
Enclosures: OK
Ground indication lamp: N/A
INO Kit: N/A
Drawings/Manuals: N/A
SECS/GEM Function: OK
System 24V UPS: N/A
Light tower: G/Y/R
SPC Function: OK
Does controller pcomp. algorithm type: Turbo dose DI (1526990)
Spare parts: N/A
Alignment tools: N/A
Sub-systems:
Main Transformer: TAVR, 3 Phase, 60 Hz, 50 KVA, Pri. 440 V
RP1: Ebara, A70WN
RP2: Ebara, A70W
Compressor 1: CTI_CRYOGENICS, 9650
Input power: 208 V, 60 Hz, 3 Phase, 95 A, 35 KVA
Output power: 90 KeV, 20 mA
2001 vintage.
EATON NOVA / AXCELIS GSD 200E2 is an ion implanter and monitor developed by AXCELIS, a division of EATON NOVA Technologies, Inc. It offers superior performance, reliability, and versatility for ion implantation processes. AXCELIS GSD 200E-2 offers a wide range of implant depths and diameters, up to 8 kV and 3.0 T/m respectively. It incorporates a closed beamline design, and is equipped with source and beamline gas systems. The gas systems, regulated from outside the beamline, provide optimal particle energy, working pressure, angular shapes, and position of the filament. EATON NOVA GSD 200 E2 is equipped with a state-of-the-art control system for both manual and automated operation. From the touch panel display, the user can control the chamber pressure, filaments, and the settings. It also has a built-in diagnostics feature that enables the operator to monitor the system in real time and remotely, including the temperature, voltage, and gas levels. EATON NOVA / AXCELIS GSD 200E-2 is built with a removable mechanical shutter, which provides additional safety and accuracy. In terms of safety and other performance features, AXCELIS GSD 200 E2 is equipped with an acoustic enclosure, as well as radiation and vacuum enclosures that meet the safety requirements of semiconductor processing. AXCELIS GSD 200E2 is the only ion implanter and monitor that is capable of providing fast and precise readings in the high performance implanter service market. Not only does GSD 200E2 provide precise implantations, it also monitors and controls the environment throughout the process. It is able to detect and respond to particle trajectories, beam profile, and statistical parameters. With advanced sensors and software design, the system is able to ensure precise implantation performance and less particle damage. In addition, EATON NOVA / AXCELIS GSD 200 E2 allows for tight implantation ofsmall particles. This is essential for tech processes, like MEMS and other micro-device fabrication. EATON NOVA GSD 200E-2 also features a broad range of particle types and sizes, as well as high speed switching between different ion species. With high accuracy and minimal degradation, GSD 200E-2 is the highest performance ion implanter and monitor in the market.
There are no reviews yet