Used EATON NOVA / AXCELIS GSD 200E2 #9312589 for sale
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ID: 9312589
High current implanter, 8"
SMIF System: Interface
Handle systems:
SDLC System
In air robot
Load buffer
Dummy buffer
Vacuum cassette
Tilt stand
Notch aligner
Process chamber:
Batch
Disk 13-pads, 8"
In-vacuum arm
Wafer holder
AFFINITY Disk chiller
AFFINITY Single close loop cooling chiller
Vacuum system:
CTI-CRYOGENICS 8200 Cryo compressor
CTI-CRYOGENICS 9700 Cryo compressor
CTI-CRYOGENICS OB 8 Beam line cryo pump
CTI-CRYOGENICS OB 10 Beam line cryo pump
No process cryo pump
EDWARDS STP-2203C Source high vacuum pump
EDWARDS QDP Rough pump
HCIG Vacuum gauge controller
End station:
4-Cassette table
Wafer aligner type: Notch aligner
Wafer handling system: In air / In vacuum high throughput
Particle filter system: Class 1 UPLA
Implant angle:
2-Axis variable: ± 7°
Quad implant capability
Process disk spindle: GSD Direct drive
Beam monitor system:
In situ beam potential monitor
Real-time patented dose control
Real-time beam profiler (1D)
Process disk: Silicon coated UHD small radius fences
Process disk cooling interlock
ASYST LTP2000 SMIF Interface
Gas box option:
Modular gas box / 4-Strings option
1 HP (MFC Unit 1660)
3 SDS (MFC Unit 1662)
Extraction power supply: 90 keV
Extraction voltage monitor
Vaporizer
Ion source: ELS
Source bushing: Extended life bushing
Extraction electrode: Type 34
Source injection kit
AMU System: Triple index
Post accel power supply: 90 keV
Post accel electrode
Terminal isolation transformer: Dry transformer
Bias aperture assembly
Flag faraday
Secondary electron flood gun: PEF
Control UPS
Main isolation transformer
Smoke detector
Exhaust flow switch
Water leak sensor
Light tower
No real-time particle detection
Earthquake retrofit
SUN Solaris operator workstation
Hard Drive Drive (HDD)
LCD Monitor, 21"
SECS I and SECS II Protocols
GEM Interface and Ethernet ports
CIM: Solaris
2006 vintage.
EATON NOVA / AXCELIS GSD 200E2 is an ion implanter and monitor equipment designed to provide superior ion implantation performance, process control and uniformity. The system offers a variety of configurations for high-energy ion implantation of both ionized and non-ionized species with outstanding performance and accuracy. AXCELIS GSD 200E-2 is a multi-axis unit that combines a 2-axis scanning and acceleration machine with a 4-axis servo motion tool for targeting and optimization of ion implantation. The asset uses a 200 mm diameter RF-driven implantation gun to produce ions in a smooth, uniform profile across the substrate surface. The motion of the gun is achieved through advanced servo-controllers and independent magnetic fields. The model is equipped with an onboard detector for monitoring the implantation process. This detector can also be used in combination with specialized monitoring strategies to control the implantation rate and uniformity. EATON NOVA GSD 200 E2 is designed to meet the harsh requirements of modern semiconductor processing. It is compliant with strict safety regulations and is equipped with an array of safety features to protect operators from both the risk of radiation and the potentially hazardous materials used in the implantation process. Additionally, the equipment is equipped with industry-leading automation capabilities, allowing for straightforward operation and optimization of the implantation process. Overall, EATON NOVA GSD 200E-2 is a reliable, controllable and accurate ion implantation system designed to provide superior results. It offers a wide range of capabilities, including high-energy ion implantation of both ionized and non-ionized species, excellent process control and comfortable operation. The unit also meets strict safety requirements, ensuring a pleasant and safe working environment.
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