Used EATON NOVA / AXCELIS GSD Classic #9243444 for sale
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ID: 9243444
Wafer Size: 5"
Vintage: 1996
High current ion implanter, 5"
Gas options:
Gas1: PH3 SDS
Gas2: ASH3 SDS
Gas3: BF3 SDS
Gas4: AR HP
Ion source: Bernas ion source (No vaporizer assembly)
S Control DI
Filament PS
Arc PS
Extraction HVPS
Suppression PS
Terminal PD DI
Analyzer magnet PS
Source magnet PS
TC Control DI
Gaussmeter / Probe
High voltage stack
EBARA AA10 Source rough pump
Accel HVPS
Accel supression
Accel HV stack
Robot control DI
Wafer transfer
Loadlock controller
Electron shower PS
Electron shower assembly
Cryo pumps (P2,9): (2) CTI Torr 8 and (2) Torr 10
Cryo compressors: CTI (2) 8200 and (2) 9600
EBARA AA70 Roughing pump (RP2)
CELL 133 Cell controller
(4) Cassette tables
Load buffer
Vacuum cassette
Dummy buffer
Cassette stand
LCD Monitor
Sun workstation
Rotary drive motor: Belt drive
Rotary drive DI
HCIG Controller
Flat aligner
Main power: 50 kVA, 208 V, 3-Phase, 5-Wire, 50 Hz
1996 vintage.
EATON NOVA / AXCELIS GSD Classic ion implanter and monitor is a high-performance scanning device designed for implanting ions into semiconductor materials. This powerful and exacting device utilizes electron-capture (ECD) technology to precisely control the dosage and concentration of ions that are implanting into the semiconductor materials. It is accurate to within 0.1%, ensuring that the material is properly treated for its intended application. AXCELIS GSD Classic monitor has a 32-bit color LCD touch screen for easy viewing of the data. The graphical user interface (GUI) is designed for convenience; its user-friendly menus provide quick access to settings and allow operators to customize the monitoring process to meet their specific needs. The device features a removable storage device which allows for easy data management. EATON NOVA GSD Classic ion implanter and monitor is designed for low-maintenance operation and efficient operation. The device is equipped with a high-performance accelerator which is capable of carrying out precise implant operations in a fraction of the time needed for traditional procedures. It is also designed for safety, featuring a radiation-proof external casing and a detailed vibration monitoring system which alerts operators of any excessive noise or temperature spikes. GSD Classic ion implanter and monitor is currently one of the most advanced systems of its kind available in the market today. It is an excellent choice for semiconductor companies and laboratories which need precision, speed, and reliability in their ion implantation and monitoring processes. Its high-quality components and reliable performance make it an invaluable tool for just about any project.
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