Used EATON NOVA / AXCELIS GSD #9103073 for sale

EATON NOVA / AXCELIS GSD is an ion implanter and monitor equipment created by Eaton AXCELIS Pte. Ltd. This system is specifically designed for implantation of high-energy ions like boron, phosphorus, and arsenic into materials for various applications, such as semiconductor manufacturing and advanced materials processing. It is capable of applying Implant energies up to 7 mesaVolt and supports a range of substrates, up to 14 inches in diameter. The unit utilizes a direct gas replacement machine for improved stability and uniformity of the ion beam. AXCELIS GSD offers a powerful set of features to enhance the work capabilities of the user. It includes a gas flow delivery tool that utilizes dual-ion source configurable to two ion species. This allows the user to independently control the quantities of the ions for improved beam uniformity and quality. The unit is equipped with advanced monitoring features, such as four channel Ion Source Temperature Control and Beam Positioning, enabling tighter control over the beam parameters. A Protective Manifold is also provided to help avoid over-ionizing of the samples. The asset also has an automated beam-centering and shimming model which can help further improve the uniformity of the ion beam. This equipment also has a full-featured data acquisition system with conversational software, enabling the user to accurately monitor implant process parameters and make adjustments as needed. Additionally, the unit has an integrated digital signal processing machine which can help minimize any instances of persistent ionization of the sample or machine-related errors and irregularities. Lastly, the equipped scanning electron microscope enables the user to observe the beam and substrate and the effects of the implantation process. EATON NOVA GSD is a highly advanced, reliable, and versatile ion implantation and monitoring tool. It's dual-ion source configuration, automated beam-centering and shimming, data acquisition, and digital signal processing systems provide the user with unparalleled control over the implantation process. Additionally, the Protective Manifold, integrated scanning electron microscope, and four channel Ion Source Temperature Control and Beam Positioning gives the user a higher level of safety and accuracy for their implantation work. In summary, GSD is the ideal choice for those looking for an advanced ion implantation and monitoring asset.