Used EATON NOVA / AXCELIS GSD #9210440 for sale
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ID: 9210440
Wafer Size: 6"
Ion implanter, 6"
Energy: 160 keV
(17) Batch wafers
Utility configuration:
Tool specification:
Line power:
Input power: 208VAC, 3 Phase, 60Hz, 130A, 42kVA
Output power: 160KeV, 20mA
Utility gas:
Name / Connection type / Size
CDA / SWAGELOK / 3/8” SUS Male
Ar / SWAGELOK / 3/8” SUS Male
PN2 / SWAGELOK / 3/8” SUS Male
GN2 / SWAGELOK / 3/8” SUS Male
Gas box N2 / SWAGELOK / 3/8” SUS Male
Exhaust:
Qty / Description / Type / Flow rate (CFM) / Size / Exhaust hood
(2) / Environments / GEX / 500 / 4", PVC / Y
(1) / Cryo pump / SEX / 40 / 1", SUS / Y
(2) / Gas cabinets / SEX / 600 / 2", PVC / Y
(2) / RP Exhausts / SEX / 100 / KF-40, Clamp / Y
Cooling water:
Description / Pressure (PSI) / Flow rate (GPM) / Temperature (°C) / Size
City water / 100 / 20 / 25 / 1", SUS, Clamp
DI Water refill / Manual / Manual / - / 1", PVC, Clamp
System configuration:
End station module:
Notch / Flat finder: Flat
Cassette type: Standard
Dummy cassette
Load buffer
Vacuum cassette
(4) Cassette tables
Cell controller
Loadlock type: GSD100/200
Process module:
Disk: NV-GSD
In-vac arm
Wafer holder
Pedestal
Gyro: NV-GSD-100
Linear drive
Belt drive
Beamline type: GSD 200
Maximum extraction voltage: 160KeV
AMU: Axcelis
Source module:
Source head: IAS
Filament PS: EMI EMS 10-60
Arc PS: EMI EMS 150-7
Source magnet PS: EMI EMS 40-25
Source bushing
Source injection: MKS 1640
Vacuum system:
P1 / Source turbo: STP-A2000C
P2 / Resolving cryo pump: CTI
P3 / V3 Cryo pump: CTI
(3) Ground bars
Sub-systems:
NESLAB HX-150
CTI 8300/8500
1994-1995 vintage.
EATON NOVA / AXCELIS GSD is an ion implanter and monitor designed for high throughput ion implantation applications. It can be used to process a variety of materials, including semiconductors, ceramics and thin films. The device runs on a proprietary software package, AXCELIS GSD Implantation Software, which enables flexible and optimized process control. The implantation process is accelerated by a diodegun, capable of high-energy delivery, and a 12-way beamline enables multiple implant species/energies to be used independently. It features a 410 mm-square wafer chuck and fixed-chamber architecture to enable high throughput operations. The process is monitored with a range of sensors that measure ion current, pressure, temperature, gas flow and wafer position. The device also integrates advanced diagnostics and feedback control systems which allow fast and accurate measurement of critical process parameters. In addition, analytical tools for post-implantation review and process optimization are included as part of the software package. EATON NOVA GSD intelligent control system optimizes implantation to reduce cycle time, minimise total costs and ensure the highest levels of implantation accuracy. To ensure safety during process operations, the device features multiple safety systems, including safety interlocks and alarms for leak detection. Its modular layout also allows for easy installation, operation and maintenance. This versatile system is used in industrial markets including medical device, aerospace and automotive components, as well as for research and development purposes. It provides an excellent platform for both R&D work and high-volume manufacturing.
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