Used EATON NOVA / AXCELIS HC3 Ultra #9411352 for sale
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ID: 9411352
Ion implanter
YASKAWA Robot
YASKAWA XU-ACL4140 Robot track
Disk type: Variable Speed Drive (VSD)
Wafer transfer type: In-Air
Dry transformer
HYT
Vacuum ARM: CAM Arm
(3) CTI-CRYOGENICS 250 F (On-board) Cryo pumps
(2) CTI-CRYOGENICS 9600 Compressors
Shower type: P-Shower 11020020
Cell type: V6
BROOKS AUTOMATİON Fixload load port
Spare parts:
Part number / Description
1187286 / Disk TC DI Cryo interlock
11053210 / Cell controller V6
11049380 / Scan controller
11054580 / Wafer transfer controller
11054560 / Load lock controller
1195730 / Rotary drive controller
11028010 / Rotary drive amplifier
XU-BCD3111 / YASKAWA Robot driver box
XU-CN0821 / YASKAWA Robot controller box
11050220 / Power dose controller
11017920 / Gas box controller
110000950 / Source controller
1214110 / Filament PSU
1214120 / Arc PSU
1214130 / Cathode PSU
1188151 / Terminal beam line DI
1163967 / Ground electronic DI
1163960 / Ground electronic DI
1195140 / Disk VAC DI
1188310 / Electrode manipulator DI
1214460 / Plasma filament PSU
11020020 / Plasma controller
110098500 / 100101530 / Rotary driver brake controller
2100276 / Source magnet PSU
1188375 / Terminal electronic DI
2200176 / Decal PSU
2200173 / HV PSU Extraction suppression
2200173 / HV PSU Decal suppression
11054570 / Gyro controller
11034940/ 2200175 / AMU PSU (Power ten)
2200187 / Extraction PSU
1196510 / Gyro ball screw assembly
1196610 / V43
1908930 / Air interface
1908940 / Air interface
110001490 / Wafer holder assembly
11030960 / CAM Arm assembly
110002530 / V3 Assembly
11047650 / V7
2014 vintage.
EATON NOVA / AXCELIS HC3 Ultra is a highly sophisticated ion implanter and monitor equipment designed to meet the demands of modern ion implantation applications. This tool features a high-current ion source that can accelerate ions up to 50 KeV, a multi-stage demountable vacuum chamber, an automated patterning system, and a robust control package. AXCELIS HC3 Ultra is particularly beneficial for forming high-quality layers in active microelectronics, dielectrics, and substrates. EATON NOVA HC3 Ultra uses an electrostatic immersion lens unit to ensure that a consistent beam of ions is directed towards the target area. This machine also enables the user to precisely adjust the shape of the ion beam, as well as its size and spread. Moreover, HC3 Ultra contains a multi-stage demountable vacuum chamber which helps to maintain a stable process environment for ion implantation. EATON NOVA / AXCELIS HC3 Ultra also features an advanced user-friendly interface. Its intuitive graphical user interface enables users to fully monitor the tool and adjust parameters such as the ion source current (up to 50 KeV) to control the process. The software also aids users in adjusting the beam shape and energy spread of the ions. Furthermore, users have the ability to select and switch between implant programs, as well as store custom gas mixtures. AXCELIS HC3 Ultra contains a number of other innovative features. For instance, its automated patterning asset enables users to pattern substrates with pre-selected implantation energies and doses. It also features a unique shift register that permits users to conduct enhanced layer-by-layer implantation processes. EATON NOVA HC3 Ultra is an ideal ion implanter and monitor for those engaged in advanced implantation processes. Its high-current ion source, multi-stage demountable vacuum chamber, automated patterning model, and user-friendly interface make it the optimal tool for achieving fast and accurate implantation results. Moreover, its unique shift register and adjustable beam shape and spread characteristics provide users with a wide range of options for patterning and creating high-quality layers.
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