Used EATON NOVA / AXCELIS HE3 #293651196 for sale

EATON NOVA / AXCELIS HE3 is an advanced ion implanter and monitor system designed and manufactured by Eaton AXCELIS Technologies. The device is a high-energy heavy ion implanter, capable of producing precision, high-quality implanting of materials into semiconductor wafers. The machine is equipped with advanced in-situ process monitoring and control systems to ensure consistent, reliable implantation of all semiconductor wafers. The technology behind the EDNAXCELIS HE3 is based on beam-line accelerator with a 60 MeV electron source as the energy source and a high-energy beam of ions accelerated up to 1-20*107 eV energy range. This energy level enables the implantation process to be tailored to specific requirements for various wafer production standards. The device is equipped with a range of features that optimise the implantation process, from precise alignment of the beam direction and distribution, to controlling the energy and mass of the particles. It also offers an array of additional features designed to ensure a consistent and reliable implantation of the wafers. This includes safety measures such as automatic shut-off and security alarms, allowing operators to monitor and adjust the implantation process, if needed. Furthermore, the device includes options such as a temperature monitor, to ensure the wafer temperature remains within the optimal process range. Additionally, the device includes a series of sensors and monitors that allow for precise determination of the ion injection quantity and energy levels, to help prevent the deviation of surface damage requirements. EATON NOVA HE3 also includes a series of feedback loops, allowing manufacturers to adjust parameters in real time, if necessary. This allows for precise implantation of materials, taking into account any adjustments needed due to process changes or variations within the wafers. Finally, the machine also features a range of diagnostic features, such as current monitoring, process signal analysis, voltages and sample diagnostics, helping to ensure the quality of the implanted wafers. Overall, HE3 is an advanced and reliable system specifically designed for high-quality, precise ion implantation. The device has been carefully designed to cater to the needs of semiconductor manufacturers and producers, allowing them to produce high-quality and reliable products with an unmatched degree of precision and consistency.