Used EATON NOVA / AXCELIS NV 10-160 #293821332 for sale

EATON NOVA / AXCELIS NV 10-160 is an advanced ion implanter/monitor that is used for implanting ions into various substrates in order to improve their properties. This machine is utilized in the semiconductor manufacturing industry and can be used to implant a wide range of ions into the substrates. AXCELIS NV10-160 has a powerful ion source and adjustable beam parameters, enabling it to implant ions into substrates with precise control. EATON NOVA NV 10160 is equipped with a 10 cm x 160 degree ion beam. This allows it to implant ions with an accuracy of +/- 10 micrometers per 100mm in the x-axis and +/- 1 degree in the y-axis. Additionally, it has a projection length of up to 15cm, enabling it to implant ions at larger distances. The ion source is capable of producing up to 1.6A of current at a voltage of up to 5 kilovolts, resulting in a beam current density of up to 32mA/cm2. This ensures that the substrate is uniformly implanted with ions, resulting in better performance of the device. EATON NOVA NV10-160 is also integrated with various monitoring systems. Its ion beam position monitoring and control equipment (IPMC) is capable of measuring and fine-tuning the beam position with a precision of +/- 1 micrometer in the x-axis and +/- 1 degree in the y-axis, allowing the user to implant ions accurately. Furthermore, its beam current and intensity monitoring (BCIM) system is capable of measuring and controlling the beam current and intensity, ensuring that the ions are uniformally implanted in the substrates. EATON NOVA / AXCELIS NV 10160's electronic control unit is designed with a multi-page graphical user interface (GUI). This allows the user to modify the ion implant parameters quickly, enabling them to optimize their process cycle time. Additionally, it offers various safety protocols and multiple safeguards, ensuring that the user is safely controlling the ion implant process. Overall, EATON NOVA / AXCELIS NV10-160 is an advanced ion implanter/monitor machine. It features an ion source and adjustable beam parameters, enabling it to implant ions with precise control. Furthermore, it is integrated with various monitoring systems, allowing the user to optimize the process cycle time and ensure the safety of the user.