Used EATON NOVA / AXCELIS NV 10-160 #9412140 for sale
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ID: 9412140
Wafer Size: 6"
Vintage: 1986
Ion implanter, 6"
Energies: 20~160 keV
Minimum beam current: 10 μA
Dose range: 5.0E12 to 5.0E15 Atoms / cm²
Beam current for 80 kev:
Energy (keV) / B11 (mA) / As75 (mA) / P31 (mA)
20 / 0.5 / 0.2 / 0.3
40 / 1 / 1.5 / 1
80 / 2 / 3 / 2.5
140 / 3 / 5 / 5
Throughput:
Batch size: 10 Wafer
Throughput: 100 WPH
Maximum implant time: 120 Sec
Vacuum performance:
Diffusion pump: ≤5.0E-06 Base pressure (Torr)
Cryo-Torr 8 Pump: ≤5.0E-06 Base pressure (Torr)
Cryo-Torr 8 Pump: ≤5.0E-06 Base pressure (Torr)
Maximum wafer temperature control: 100°C
X-Ray emission ≤0.6μ Sievert / hr (60μ rem / hr) at 150 mm
No UPS
Power supply: 208 VAC, 3 Phase, 4 Wire, 45 kVA, 125 Amp, 60 Hz
1986 vintage.
EATON NOVA / AXCELIS NV 10-160 is a high-energy ion implanter and monitor designed to provide precise and accurate ion implantation that is necessary in the fabrication of microchips and other important semiconductor devices. This machine uses beams of ions, which are accelerated and precisely focused and scanned onto a target substrate to change the properties of the substrate, creating precise patterns and intricate structures. AXCELIS NV10-160 is a highly reliable tool for precise and safe ion implantation. It is powered by Eaton's Central Processing Unit (CUP) and includes an array of built-in safety features to prevent accidents, including an independent beam monitoring system, a high voltage switch, an aluminum beam cage, and a high-pressure gas line for safe gas handling. EATON NOVA NV 10160 operates at a peak voltage of 160 kV and a maximum implantation dose of 1e+13 ions/cm². This machine has a beam current up to 40mA, providing precise control of the implantation dose, energy, voltage, and current. Additionally, NV 10160 is equipped with a computerized analysis system that provides precise and accurate implant data, including depth profiling, current density, and dose. Using this advanced technology, AXCELIS NV 10-160 can be used to implant a wide variety of materials such as silicon, germanium, aluminum, iron, and other metals and polymers. It is also capable of implantation of dopants, including arsenic and phosphorous. Its large chamber size means that large substrates can be implanted without compromising accuracy and uniformity. EATON NOVA / AXCELIS NV10-160 is an ideal tool for the fabrication of advanced semiconductors and other sophisticated components. Its precision and reliability make it the perfect choice for research laboratories, industrial manufacturing plants, or any other setting that requires precise ion implantation. In short, EATON NOVA / AXCELIS NV 10160 is an invaluable tool for those who need the highest level of accuracy and precision in any ion implant application.
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